{"title":"Sputtering","description":"\u003cp\u003e\u003cstrong\u003eSputtering deposits dense, adherent thin films by ejecting atoms from a solid target with energetic ions — the workhorse PVD technique for current collectors, catalyst layers, seed layers, and model electrodes in electrochemistry research.\u003c\/strong\u003e Compared with thermal evaporation, sputtering reaches a wider range of materials (metals, alloys, oxides, nitrides) and gives better step coverage and adhesion on rough or porous substrates such as gas-diffusion layers, separators, and patterned silicon.\u003c\/p\u003e\n\n\u003cp\u003eThis collection groups the hardware a lab needs to set up a working sputter line, from the deposition chamber itself to the supporting vacuum and metrology pieces.\u003c\/p\u003e\n\n\u003ch3\u003eSputtering modes commonly used in electrochemistry labs\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003e\n\u003cstrong\u003eDC magnetron sputtering\u003c\/strong\u003e — for conductive targets: Cu, Ni, Ti, Pt, Au, stainless steel. Used for thin-film current collectors and model planar electrodes.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eRF magnetron sputtering\u003c\/strong\u003e — required for insulating targets: oxides (LLZO, LiPON, Al2O3, TiO2), nitrides, and most solid-electrolyte films.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eReactive sputtering\u003c\/strong\u003e — metal target plus O2 or N2 background gas to grow oxide or nitride films (for example TiN diffusion barriers, NiOx hole-transport layers, or LiPON written from a Li3PO4 target in N2).\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eCo-sputtering\u003c\/strong\u003e — two or more targets fired simultaneously to tune alloy composition or dope a host film without remaking the target.\u003c\/li\u003e\n\u003c\/ul\u003e\n\n\u003ch3\u003eTypical research uses\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eThin-film model electrodes for fundamental kinetic, impedance, and operando studies, where mass loading and morphology must be tightly controlled.\u003c\/li\u003e\n\u003cli\u003ePatterned current collectors and interconnects for microbatteries, on-chip electrochemical cells, and 3-electrode microfabricated devices.\u003c\/li\u003e\n\u003cli\u003eCatalyst-layer deposition for fuel-cell and electrolyzer benchmarking, including ultra-low-loading Pt, IrOx, and RuOx layers on carbon papers and PTLs.\u003c\/li\u003e\n\u003cli\u003eSolid-state battery interlayers — Li-ion-conducting LiPON, garnet-side wetting layers, and metallic interlayers between Li metal and ceramic electrolytes.\u003c\/li\u003e\n\u003cli\u003eSeed and adhesion layers (Ti, Cr, TiN) under thicker electroplated or evaporated functional films.\u003c\/li\u003e\n\u003c\/ul\u003e\n\n\u003cp\u003eChoose the chamber configuration that matches your target inventory: DC-only is enough for purely metallic work; RF or DC+RF is required if you plan to deposit oxide solid electrolytes, oxide catalysts, or dielectric stacks. For routine substrate prep before deposition, see cleaning equipment; for downstream characterization of film thickness and roughness, see characterization equipment.\u003c\/p\u003e\n","products":[{"product_id":"epsbssmsc","title":"ECS-PS Benchtop Single-Source DC \u0026 RF Magnetron Sputtering Coater, EPSBSSMSC","description":"\u003cp\u003eA Benchtop DC \u0026amp; RF Magnetron Sputtering Coater is a versatile Physical Vapor Deposition (PVD) system designed for R\u0026amp;D environments. By integrating both Direct Current (DC) and Radio Frequency (RF) power sources, this single unit can deposit a wide array of materials, from conductive metals to insulating ceramics and oxides.\u003c\/p\u003e\n\u003cp\u003eIndustrial-grade benchtop models are designed for precision within a small footprint: (1) \u003cstrong\u003eMagnetron Sputtering Head\u003c\/strong\u003e: Uses strong magnets behind the target to trap electrons, increasing plasma density and allowing for lower operating pressures (10^{-3} to 10^{-2} mbar). (2) \u003cstrong\u003eChamber\u003c\/strong\u003e: Usually a high-purity stainless steel or quartz cylinder with a hinged lid for easy target swapping. (3) \u003cstrong\u003eSample Stage\u003c\/strong\u003e: Typically heatable (up to 500 ℃) and rotatable (1–20 RPM) to ensure the Al2O3 or ZnO coating is uniform across the entire electrode surface. (4) \u003cstrong\u003eGas Control\u003c\/strong\u003e: Uses Mass Flow Controllers (MFC) for Argon (sputtering gas) and sometimes Oxygen\/Nitrogen for \"Reactive Sputtering.\"  \u003c\/p\u003e\n\u003ctable width=\"100%\" style=\"height: 592.8px;\"\u003e\n\u003ctbody\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eEPSBSSMSC (EPS-BSSMSC)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003cem\u003ePower\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eAC220V±10%, single-phases, 50\/60Hz, 2000 W\u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 32.8px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 32.8px;\"\u003e\u003cem\u003eMagnetron Sputtering Sources\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 32.8px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eDC mode: 500 W for metal sputtering\u003c\/li\u003e\n\u003cli\u003eRF mode: 300 W, 14 kHz for non-metal sputtering\u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 263.2px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 263.2px;\"\u003e\u003cem\u003eMagnetron Sputtering Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 263.2px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eMagnetron Sputtering Head: 2\" head (1 unit for standard) with water cooling jackets. Multiple magnetron heads can be supplied upon request. \u003c\/li\u003e\n\u003cli\u003eThe shutter can be manually to open\/block the sputtering pathway\u003c\/li\u003e\n\u003cli\u003eSputtering target with Φ2\" x T1\/8\"\u003c\/li\u003e\n\u003cli\u003eSputtering Distance: 50-80 mm, adjustable. Sputtering Angle: 0-25\u003cspan\u003e°\u003c\/span\u003e\n\u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003eSample Stage Temperature: ≤350 ℃\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003eMechanical Vacuum Pump + Turbo Pump (\u003cspan style=\"color: rgb(255, 42, 0);\"\u003eOptional\u003c\/span\u003e): 5*10^(-5) Pa\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003eVacuum Chamber Size: Φ220×H340 mm \u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003eA Water chiller is included to cool down the cover flange.\u003c\/span\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 67.2px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 67.2px;\"\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 67.2px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 86.8px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 86.8px;\"\u003e\u003ci\u003eDimension\u003c\/i\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 86.8px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003eL600 × W600 × H1000 mm\u003c\/li\u003e\n\u003cli\u003eIt can be integrated with Ar-filled glovebox for air\/humidity-sensitive materials processing \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003ci\u003eWeight\u003c\/i\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003e~90 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e \u003c\/p\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S0378775315306662\"\u003eS. Lobe, et al., Radio frequency magnetron sputtering of Li7La3Zr2O12 thin films for solid-state batteries, Journal of Power Sources, 2016, 307, 684-689\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S2405829721001549\"\u003eY. Ma, et al., Materials and structure engineering by magnetron sputtering for advanced lithium batteries, Energy Storage Materials, 2021, 39, 203-224\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/advanced.onlinelibrary.wiley.com\/doi\/abs\/10.1002\/aenm.202403117\"\u003eY. Yao, et al., Prospective of Magnetron Sputtering for Interface Design in Rechargeable Lithium Batteries, Adv. Energy Mater., 2024, 14, 2403117\u003c\/a\u003e. \u003c\/p\u003e","brand":"PDZK","offers":[{"title":"DC","offer_id":47612688531686,"sku":"EPSBSSMSCDC","price":8888888.0,"currency_code":"USD","in_stock":true},{"title":"DC \u0026 RF","offer_id":47612688597222,"sku":"EPSBSSMSCDCRF","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EPSBSSMSC_main.png?v=1777664607"},{"product_id":"ecessdcmsc","title":"ECS-C Economic Single-Source DC Magnetron Sputtering Coater, ECESSDCMSC","description":"\u003cp\u003eA Single-Source DC Magnetron Sputtering Coater is a streamlined Physical Vapor Deposition (PVD) system designed for depositing high-quality conductive thin films. Unlike multi-source or RF systems, this configuration is optimized for a single material target—typically a metal—making it the \"workhorse\" for creating current collectors, seed layers, and conductive contacts in battery research.\u003c\/p\u003e\n\u003cp\u003eAs for depositing metallic materials, Direct Current (DC) is the most efficient power source. (1) \u003cstrong\u003eHigh Deposition Rate\u003c\/strong\u003e: DC sputtering is significantly faster than RF sputtering for metals like Copper (Cu), Aluminum (Al), Titanium (Ti), and Gold (Au). (2) \u003cstrong\u003eSystem Simplicity\u003c\/strong\u003e: It does not require complex impedance matching networks, making it more reliable and easier to maintain in a busy R\u0026amp;D lab. (3) \u003cstrong\u003eCost-Effectiveness\u003c\/strong\u003e: Single-source DC units have a smaller footprint and lower power requirements, ideal for benchtop installation or integration into a single-chamber glovebox.\u003c\/p\u003e\n\u003ctable width=\"100%\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eECESSDCMSC (EC-ESSDCMSC)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePower\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eAC220V±10%, single-phases, 50\/60Hz, 2000 W\u003c\/li\u003e\n\u003cli\u003eDC power output is 500 W\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eSample Stage \u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eΦ100 mm\u003c\/li\u003e\n\u003cli\u003eHeating Temperature: RT-500 °C\u003c\/li\u003e\n\u003cli\u003eRotation Speed: Max. 20 rpm\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eSputtering Gun\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003e2\" \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eVacuum Chamber System\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eQuartz (Φ180mm*H200 mm) or SS304 (Φ194mm*H250 mm)\u003c\/li\u003e\n\u003cli\u003eVacuum Port: KF40; Ventilation Port: KF16\u003c\/li\u003e\n\u003cli\u003eVacuum Level: 0.3 Pa\u003c\/li\u003e\n\u003cli\u003eVacuum Pump Speed: 1.1 L\/s (turbo pump with 600 L\/s is available upon request).\u003c\/li\u003e\n\u003cli\u003eThe real-time film thickness gauge is available upon request (\u003cspan style=\"color: rgb(255, 42, 0);\"\u003enot included\u003c\/span\u003e).\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e            \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ECESSDCMSC_03_100x100.png?v=1777699830\" alt=\"\" style=\"float: none;\"\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eDimension\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eL550 × W350 × H400 mm\u003c\/li\u003e\n\u003cli\u003eIt can be integrated with Ar-filled glovebox for air\/humidity-sensitive materials processing \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eWeight\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003e~90 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S0378775315306662\"\u003eS. Lobe, et al., Radio frequency magnetron sputtering of Li7La3Zr2O12 thin films for solid-state batteries, Journal of Power Sources, 2016, 307, 684-689\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S2405829721001549\"\u003eY. Ma, et al., Materials and structure engineering by magnetron sputtering for advanced lithium batteries, Energy Storage Materials, 2021, 39, 203-224\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/advanced.onlinelibrary.wiley.com\/doi\/abs\/10.1002\/aenm.202403117\"\u003eY. Yao, et al., Prospective of Magnetron Sputtering for Interface Design in Rechargeable Lithium Batteries, Adv. Energy Mater., 2024, 14, 2403117\u003c\/a\u003e. \u003c\/p\u003e","brand":"CYKY","offers":[{"title":"Quartz","offer_id":47617811874022,"sku":"ECESSDCMSCQ","price":8888888.0,"currency_code":"USD","in_stock":true},{"title":"SS304","offer_id":47617811906790,"sku":"ECESSDCMSCSS","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ECESSDCMSC_01.png?v=1777699600"}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/collections\/EPSBSSMSC_main.png?v=1777664678","url":"https:\/\/echemsupplies.com\/collections\/sputtering.oembed","provider":"EChem Supplies","version":"1.0","type":"link"}