{"title":"Vapor-Phase Synthesis","description":"\u003cp\u003e\u003cstrong\u003eVapor-phase synthesis is how electrochemists build the films, coatings, and nanostructures that solution routes cannot reach — atomically thin oxide protection on cathode powders, conformal current collectors on porous gas-diffusion layers, congruent transfer of layered and garnet ceramics, and graphene grown directly on metal foils.\u003c\/strong\u003e This section gathers the deposition platforms used in battery, fuel-cell, electrolyzer, and broader electrochemistry research, organized by the physics of how vapor reaches the substrate.\u003c\/p\u003e\n\n\u003cp\u003ePick the route that matches your film requirement:\u003c\/p\u003e\n\n\u003cul\u003e\n\u003cli\u003e\n\u003cstrong\u003e\u003ca href=\"\/collections\/chemical-vapor-deposition\"\u003eChemical Vapor Deposition\u003c\/a\u003e\u003c\/strong\u003e — thermal reaction of volatile precursors at a heated substrate; the standard route for pyrolytic carbon shells on LFP and silicon, graphene and MoS2 \/ WS2 growth, and oxide or nitride overlayers on collectors and bipolar plates.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003e\u003ca href=\"\/collections\/atomic-layer-deposition\"\u003eAtomic Layer Deposition\u003c\/a\u003e\u003c\/strong\u003e — self-limiting monolayer chemistry for pinhole-free Al2O3, ZrO2, and TiO2 on layered, spinel, and olivine cathode powders, plus conformal coatings on porous catalyst supports and lithium-metal anodes.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003e\u003ca href=\"\/collections\/sputtering\"\u003eSputtering\u003c\/a\u003e\u003c\/strong\u003e — momentum-driven PVD for dense metal, alloy, oxide, and nitride films; DC for conductive targets, RF for insulators such as LLZO and LiPON, reactive and co-sputtering for tuned stoichiometry.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003e\u003ca href=\"\/collections\/thermal-evaporation\"\u003eThermal Evaporation\u003c\/a\u003e\u003c\/strong\u003e — low-energy, line-of-sight deposition of metal contacts, lithium counter-electrodes, and soft organic or halide-perovskite layers where substrate damage must stay minimal.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003e\u003ca href=\"\/collections\/electron-beam-evaporation\"\u003eElectron-Beam Evaporation\u003c\/a\u003e\u003c\/strong\u003e — focused-beam heating for refractory metals (W, Mo, Ta, Pt, Ti) and stable oxides (Al2O3, SiO2, HfO2, ZrO2) that sit beyond resistive-source vapor pressures.\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003e\u003ca href=\"\/collections\/pulsed-laser-deposition\"\u003ePulsed Laser Deposition\u003c\/a\u003e\u003c\/strong\u003e — congruent ablation of dense ceramic targets for stoichiometric perovskite, layered-oxide, and garnet solid-electrolyte films, including epitaxial model electrodes.\u003c\/li\u003e\n\u003c\/ul\u003e\n\n\u003cp\u003eIf you need conformality on porous or particulate substrates, start with ALD or powder CVD. For dense planar films and current collectors, sputtering or thermal evaporation is usually the shortest path. For complex-stoichiometry oxides and solid electrolytes, PLD or e-beam is the right tool. For solution, mechanochemical, and furnace alternatives, step up to Synthesis Equipment.\u003c\/p\u003e\n","products":[{"product_id":"egs2ste","title":"ECS-GS 2-Source Thermal Evaporator (Samples≤60mm*60mm), EGS2STE","description":"\u003cp\u003eA 2-Source Thermal Evaporator (often called a co-evaporation system) is a physical vapor deposition (PVD) tool designed to heat and evaporate two different source materials simultaneously or sequentially within a high-vacuum chamber. This setup is essential for creating alloy thin films, doped layers, or multi-layer coatings without breaking vacuum.\u003c\/p\u003e\n\u003cp\u003eThe thermal evaporation process relies on passing a high electrical current through a resistive heating element (the \"source\") which holds the coating material. (1) \u003cstrong\u003eVacuum Environment\u003c\/strong\u003e: The chamber is pumped down to high vacuum (typically 10^{-5} to 10^{-7} Torr) to ensure the evaporated atoms have a long mean free path and do not oxidize. (2) \u003cstrong\u003eDual Source Configuration\u003c\/strong\u003e: Two independent power supplies control two separate heating elements (boats, filaments, or crucibles). (3) \u003cstrong\u003eEvaporation\u003c\/strong\u003e: The materials reach their sublimation or melting point and turn into a vapor. (4) \u003cstrong\u003eDeposition\u003c\/strong\u003e: The vapor travels in a line-of-sight path and condenses onto a substrate located above the sources.\u003c\/p\u003e\n\u003ctable style=\"height: 1259px;\" width=\"100%\"\u003e\n\u003ctbody\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eEGS2STE (EGS-2STE)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 67.2px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 67.2px;\"\u003e\u003cem\u003ePower\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 67.2px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eAC380V±10%, three-phases, 50\/60Hz, 3000 W\u003c\/li\u003e\n\u003cli\u003eAC220V±10% can be supplied upon request.\u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 184.8px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 184.8px;\"\u003e\u003cem\u003eVacuum System Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 184.8px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eVacuum Chamber: SS304, L260*D260*H450mm\u003c\/li\u003e\n\u003cli\u003eTwo doors (front and back), and an observation window\u003c\/li\u003e\n\u003cli\u003eTurbo pump, gate valve, vacuum gauge, and gas filling valve, and angle valve are installed at chamber side. \u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003eVacuum Level: 5*10^(-5) Pa, normally it takes 40 min to approach this target.\u003c\/li\u003e\n\u003cli\u003eSample change and addition can be conducted without stop of turbo pump. \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 226.8px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 226.8px;\"\u003e\u003cem\u003eSample Loading System\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 226.8px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eThe sample loading stage adopts the \"insertion\" structure and the maximum sample size is \u003cspan style=\"color: rgb(255, 42, 0);\"\u003e60mm*60mm\u003c\/span\u003e. \u003c\/li\u003e\n\u003cli\u003eDistance between mask to sample is 0.2 mm. \u003c\/li\u003e\n\u003cli\u003eSample stage rotation speed: 30 rpm\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e          \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EGS2STE_02_100x100.png?v=1777188932\" alt=\"\" style=\"float: none;\"\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 323.8px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 323.8px;\"\u003e\u003cem\u003eDeposition System\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 323.8px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eTwo evaporation sources that cover metal, organic, and inorganic materials. Each evaporation source has individual cooling system. \u003c\/li\u003e\n\u003cli\u003eVertical distance between source and substrate is ~300 mm.\u003c\/li\u003e\n\u003cli\u003eSeparation plate is designed for avoiding cross-contamination.\u003c\/li\u003e\n\u003cli\u003eDC power source: 8V-180A, 1.5 kW. \u003c\/li\u003e\n\u003cli\u003eMax. Temperature: 1500℃ (adjusting current to control the heating temperature and heating rate for evaporation).\u003c\/li\u003e\n\u003cli\u003eA thickness monitor (GT ITC-5) with quartz crystal microbalance (QCM) unit is installed for tracking the in-real thickness. \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e           \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EGS2STE_03_100x100.png?v=1777189889\" alt=\"\" style=\"float: none;\"\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 207.2px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 207.2px;\"\u003e\u003cem\u003eControl System\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 207.2px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eHMI touch screen control.\u003c\/li\u003e\n\u003cli\u003eAutomatic and manual control on\/off of the mechanical and turbo vacuum pump, valve, and electrode switch. \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e        \u003cimg style=\"float: none;\" alt=\"\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EGS2STE_04_100x100.png?v=1777190650\"\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 39.2px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 39.2px;\"\u003e\u003cem\u003eAccessories (\u003cspan style=\"color: rgb(255, 42, 0);\"\u003eOptional\u003c\/span\u003e)\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 39.2px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eA water chiller (\u003ca href=\"https:\/\/echemsupplies.com\/products\/eadtcwc?variant=47528488698086\"\u003eEADTCWC\u003c\/a\u003e) within 10-25 ℃ and 0.1-0.3 MPa is required for cooling the evaporation electrodes and turbo pump. \u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e          \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EADTCWC_main_100x100.png?v=1775781572\" alt=\"\" style=\"float: none;\"\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003eA gas compressor (\u003ca href=\"https:\/\/echemsupplies.com\/products\/euqofgc?variant=47513044156646\"\u003eEUQOFGC\u003c\/a\u003e) is needed to provide gas pressure of 60-80 psi for controlling pneumatic valves.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e        \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EUQOFGC_main_100x100.png?v=1775414665\" alt=\"\" style=\"float: none;\"\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 67.2px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 67.2px;\"\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 67.2px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003ci\u003eDimension\u003c\/i\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003eL900 * W700 * H1500 mm\u003c\/li\u003e\n\u003cli\u003eIt can be integrated with Ar-filled glovebox for air\/humidity-sensitive materials (eg: Li) evaporation and deposition. \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003ci\u003eWeight\u003c\/i\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003e~300 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e \u003c\/p\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/advanced.onlinelibrary.wiley.com\/doi\/full\/10.1002\/aenm.202203256\"\u003eE. Adhitama, et al., On the Practical Applicability of the Li Metal-Based Thermal Evaporation Prelithiation Technique on Si Anodes for Lithium Ion Batteries, Adv. Energy Mater., 2023, 13, 2203256\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/pii\/S2666248524000039\"\u003eL. Fallarino, et al., On the practical applicability of thermal evaporation technique to fabricate Na thin metal anodes for Na-metal batteries, Journal of Power Sources Advances, 2024, 26, 100137\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/pii\/S0378775324011704\"\u003eB. Acebedo, et al., On the role of ultrathin lithium metal anodes produced by thermal evaporation, Journal of Power Sources, 2024, 618, 235218\u003c\/a\u003e. \u003c\/p\u003e","brand":"GTKJ","offers":[{"title":"Default Title","offer_id":47577653149926,"sku":"EGS2STE","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EGS2STE_main.png?v=1777188887"},{"product_id":"egm4ste","title":"ECS-GM 4-Source Thermal Evaporator (Samples≤135mm*136mm), EGM4STE","description":"\u003cp\u003eA 2-Source Thermal Evaporator (often called a co-evaporation system) is a physical vapor deposition (PVD) tool designed to heat and evaporate four different source materials simultaneously or sequentially within a high-vacuum chamber. This setup is essential for creating alloy thin films, doped layers, or multi-layer coatings without breaking vacuum.\u003c\/p\u003e\n\u003cp\u003eThe thermal evaporation process relies on passing a high electrical current through a resistive heating element (the \"source\") which holds the coating material. (1) \u003cstrong\u003eVacuum Environment\u003c\/strong\u003e: The chamber is pumped down to high vacuum (typically 10^{-5} to 10^{-7} Torr) to ensure the evaporated atoms have a long mean free path and do not oxidize. (2) \u003cstrong\u003eDual Source Configuration\u003c\/strong\u003e: Two independent power supplies control two separate heating elements (boats, filaments, or crucibles). (3) \u003cstrong\u003eEvaporation\u003c\/strong\u003e: The materials reach their sublimation or melting point and turn into a vapor. (4) \u003cstrong\u003eDeposition\u003c\/strong\u003e: The vapor travels in a line-of-sight path and condenses onto a substrate located above the sources.\u003c\/p\u003e\n\u003ctable style=\"height: 1259px;\" width=\"100%\"\u003e\n\u003ctbody\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eEGM4STE (EGM-4STE)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 67.2px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 67.2px;\"\u003e\u003cem\u003ePower\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 67.2px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eAC380V±10%, three-phases, 50\/60Hz, 5000 W\u003c\/li\u003e\n\u003cli\u003eAC220V±10% can be supplied upon request.\u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 184.8px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 184.8px;\"\u003e\u003cem\u003eVacuum System Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 184.8px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eVacuum Chamber: SS304, \u003cspan style=\"color: rgb(255, 42, 0);\"\u003eL400*D400*H560mm\u003c\/span\u003e\n\u003c\/li\u003e\n\u003cli\u003eTwo doors (front and back), and an observation window\u003c\/li\u003e\n\u003cli\u003eTurbo pump, gate valve, vacuum gauge, and gas filling valve, and angle valve are installed at chamber side. \u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003eVacuum Level: 5*10^(-5) Pa, normally it takes 30 min to approach this target.\u003c\/li\u003e\n\u003cli\u003eSample change and addition can be conducted without stop of turbo pump. \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 226.8px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 226.8px;\"\u003e\u003cem\u003eSample Loading System\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 226.8px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eThe sample loading stage adopts the \"insertion\" structure and the maximum sample size is \u003cspan style=\"color: rgb(255, 42, 0);\"\u003e135mm*135mm\u003c\/span\u003e. \u003c\/li\u003e\n\u003cli\u003eCooling system is associated with the sample. \u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003eSample stage rotation speed: 30 rpm\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e          \u003cimg style=\"float: none;\" alt=\"\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EGM4STE_02_100x100.png?v=1777193373\"\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 323.8px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 323.8px;\"\u003e\u003cem\u003eDeposition System\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 323.8px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eFour evaporation sources that cover metal, organic, and inorganic materials. Each evaporation source has individual cooling system. \u003c\/li\u003e\n\u003cli\u003eVertical distance between source and substrate is ~350 mm.\u003c\/li\u003e\n\u003cli\u003eSeparation plate is designed for avoiding cross-contamination.\u003c\/li\u003e\n\u003cli\u003eDC power source: 8V-180A, 1.5 kW. \u003c\/li\u003e\n\u003cli\u003eMax. Temperature: 1500℃ (adjusting current to control the heating temperature and heating rate for evaporation).\u003c\/li\u003e\n\u003cli\u003eA thickness monitor (Inficon SQC-310, resolution ±0.015 Å, speed display of 0.01 Å\/s) with quartz crystal microbalance (QCM) unit is installed for tracking the in-real thickness. \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e           \u003cimg style=\"float: none;\" alt=\"\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EGM4STE_03_100x100.png?v=1777193374\"\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 207.2px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 207.2px;\"\u003e\u003cem\u003eControl System\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 207.2px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eHMI touch screen control.\u003c\/li\u003e\n\u003cli\u003eAutomatic and manual control on\/off of the mechanical and turbo vacuum pump, valve, and electrode switch. \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e        \u003cimg style=\"float: none;\" alt=\"\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EGS2STE_04_100x100.png?v=1777190650\"\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 39.2px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 39.2px;\"\u003e\u003cem\u003eAccessories (\u003cspan style=\"color: rgb(255, 42, 0);\"\u003eOptional\u003c\/span\u003e)\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 39.2px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eA water chiller (\u003ca href=\"https:\/\/echemsupplies.com\/products\/eadtcwc?variant=47528488698086\"\u003eEADTCWC\u003c\/a\u003e) within 10-25 ℃ and 0.1-0.3 MPa is required for cooling the evaporation electrodes and turbo pump. \u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e          \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EADTCWC_main_100x100.png?v=1775781572\" alt=\"\" style=\"float: none;\"\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003eA gas compressor (\u003ca href=\"https:\/\/echemsupplies.com\/products\/euqofgc?variant=47513044156646\"\u003eEUQOFGC\u003c\/a\u003e) is needed to provide gas pressure of 60-80 psi for controlling pneumatic valves.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e        \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EUQOFGC_main_100x100.png?v=1775414665\" alt=\"\" style=\"float: none;\"\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 67.2px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 67.2px;\"\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 67.2px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003ci\u003eDimension\u003c\/i\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003eL1600 * W1000 * H1900 mm\u003c\/li\u003e\n\u003cli\u003eIt can be integrated with Ar-filled glovebox for air\/humidity-sensitive materials (eg: Li) evaporation and deposition. \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003ci\u003eWeight\u003c\/i\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003e~600 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e \u003c\/p\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/advanced.onlinelibrary.wiley.com\/doi\/full\/10.1002\/aenm.202203256\"\u003eE. Adhitama, et al., On the Practical Applicability of the Li Metal-Based Thermal Evaporation Prelithiation Technique on Si Anodes for Lithium Ion Batteries, Adv. Energy Mater., 2023, 13, 2203256\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/pii\/S2666248524000039\"\u003eL. Fallarino, et al., On the practical applicability of thermal evaporation technique to fabricate Na thin metal anodes for Na-metal batteries, Journal of Power Sources Advances, 2024, 26, 100137\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/pii\/S0378775324011704\"\u003eB. Acebedo, et al., On the role of ultrathin lithium metal anodes produced by thermal evaporation, Journal of Power Sources, 2024, 618, 235218\u003c\/a\u003e. \u003c\/p\u003e","brand":"GTKJ","offers":[{"title":"Default Title","offer_id":47577808961766,"sku":"EGM4STE","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EGM4STE_main.png?v=1777192843"},{"product_id":"eymbtaldm","title":"ECS-Y Mini Benchtop Thermal Atomic Layer Deposition (ALD) Machine (Sample: Max. 4\"), EYMBTALDM","description":"\u003cp\u003eA thermal atomic layer deposition (ALD) machine is a precise thin-film coating system that deposits materials one atomic layer at a time using alternating, self-limiting chemical reactions at elevated temperatures (150-350 degrees). It ensures high conformality and atomic-scale thickness control, ideal for high-aspect-ratio 3D structures and, typically, for creating oxides, nitrides, and other thin films\u003c\/p\u003e\n\u003cp\u003eThe key components and features are: (1) \u003cstrong\u003eReaction Chamber\u003c\/strong\u003e: Heated, high-vacuum chamber where the substrate (up to 6–8 inches, typically) is held. (2) \u003cstrong\u003ePrecursor Delivery System\u003c\/strong\u003e: Multiple heated gas lines with MFCs (Mass Flow Controllers) allow for introducing alternating precursors (e.g., metal-organic precursors and H2O, or O3). (3) \u003cstrong\u003ePulse\/Purge Valves\u003c\/strong\u003e: High-speed, high-temperature valves, such as those found on the Veeco Savannah, control the precise, alternating dosage and inert gas purge cycles.\u003c\/p\u003e\n\u003cp\u003eThe mini benchtop thermal ALD has following unique features: (1) \u003cstrong\u003eThroughput\u003c\/strong\u003e: These systems are \"one-at-a-time.\" Coating a full roll of foil for a pilot line would require a Spatial ALD or Roll-to-Roll system, which are much larger than benchtop units. (2) \u003cstrong\u003ePrecursor Costs\u003c\/strong\u003e: While the amount used is tiny, specialized precursors (like those for solid-state electrolyte coatings) can be expensive. (3) \u003cstrong\u003eCycle Time\u003c\/strong\u003e: ALD is a slow process. Deposition of a 5-10 nm layer can take 1 to 2 hours depending on the cycle purge times.\u003c\/p\u003e\n\u003cp\u003eThe general working mechanism of the thermal ALD process are shown below:\u003c\/p\u003e\n\u003cdiv style=\"text-align: start;\"\u003e\u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYMBTALDM_02_100x100.png?v=1777409245\" alt=\"\" style=\"float: none;\"\u003e\u003c\/div\u003e\n\u003ctable width=\"100%\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eEYMBTALDM (EY-MBTALDM)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePower\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eAC220V±10%, single phase, 50\/60Hz, 1500 W\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eALD Machine Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eMax. Sample: 4\" wafer with thickness less than 5 mm\u003c\/li\u003e\n\u003cli\u003eHeating Temperature: RT-360 ℃\u003c\/li\u003e\n\u003cli\u003eFor powder sample, the special powder tray can be supplied upon request.\u003c\/li\u003e\n\u003cli\u003ePrecursor: 4*50 mL precursor bubblers (2 stainless steel and 2 heated silicone types) are included. The heating temperature is RT-180 ℃. \u003c\/li\u003e\n\u003cli\u003eSix fast-response ALD valves with heating temperature of RT-200℃. \u003c\/li\u003e\n\u003cli\u003eMFC: Max. 200 sccm\u003c\/li\u003e\n\u003cli\u003eVacuum gauge: Inficon brand with maximum range of 10 Torr.\u003c\/li\u003e\n\u003cli\u003eVacuum Pump with 30 m3\/h flow\u003c\/li\u003e\n\u003cli\u003eThe ALD parameters can be edited in the touch screen and the data can be recorded in real time. \u003c\/li\u003e\n\u003cli\u003eThe alarm and safety lock are available for monitoring the temperature, pressure, and flow. \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eDimension\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eL550 * W470 * H470 mm\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eWeight\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003e~50 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/advanced.onlinelibrary.wiley.com\/doi\/abs\/10.1002\/adem.201300132\"\u003eA. Cappella, et al., High Temperature Thermal Conductivity of Amorphous Al2O3 Thin Films Grown by Low Temperature ALD, Adv. Engineering Mater., 2013, 15, 1046-1050\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/onlinelibrary.wiley.com\/doi\/abs\/10.1002\/cvde.201207033\"\u003eS. E. Potts, et al., Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD, Chemical Vapor Deposition, 2013, 19, 125-133\u003c\/a\u003e. \u003c\/p\u003e","brand":"YMKJ","offers":[{"title":"Default Title","offer_id":47585641988326,"sku":"EYMBTALDM","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYMBTALDM_main.png?v=1777408871"},{"product_id":"eypcraldm","title":"ECS-Y Rotary Atomic Layer Deposition (ALD) Machine for Powder Coating, EYPCRALDM","description":"\u003cp\u003eRotary Bed Atomic Layer Deposition (Rotary ALD) is a mechanical agitation method specifically designed to overcome the limitations of static beds and the complexities of fluidization when coating powders. It uses physical rotation to tumble the powder, ensuring every surface is exposed to the precursor gases.\u003c\/p\u003e\n\u003cp\u003eIn a rotary system, the powder is placed inside a drum or cylinder that rotates within a vacuum chamber. This movement creates a constant \"tumbling\" effect—similar to a clothes dryer or a cement mixer—which prevents particle agglomeration and eliminates \"dead zones\" where precursors might not reach. (1) \u003cstrong\u003eMechanical Mixing\u003c\/strong\u003e: The drum rotates at a controlled speed (typically 10 to 100 RPM for lab scale. (2) \u003cstrong\u003ePrecursor Dosing\u003c\/strong\u003e: Gases are introduced through the axis of rotation or via a fixed delivery tube inside the drum. (3) \u003cstrong\u003eSelf-Limiting Reaction\u003c\/strong\u003e: Just like standard ALD, the gas reacts with the surface of the moving particles until all sites are occupied. (4) \u003cstrong\u003ePurging\u003c\/strong\u003e: Inert gas sweeps through the tumbling bed to remove byproducts and excess precursor before the next cycle begins.  \u003c\/p\u003e\n\u003cp\u003eRotary ALD is particularly useful when working with cohesive powders or high-density materials (like certain metal oxides or catalysts) that are notoriously difficult to fluidize. It allows you to achieve the same Al2O3 or TiO2 conformal coating without the risk of \"slugging\" or \"channeling\" that often occurs in gas-fed columns.\u003c\/p\u003e\n\u003cp\u003eThe diagram of the general working mechanism of the rotary ALD process is shown below:\u003c\/p\u003e\n\u003cdiv style=\"text-align: start;\"\u003e\u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYPCRALDM_main_160x160.png?v=1777484663\" style=\"margin-bottom: 16px; float: none;\"\u003e\u003c\/div\u003e\n\u003ctable style=\"height: 1246.2px;\" width=\"100%\"\u003e\n\u003ctbody\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eEYPCRALDM (EY-PC-RALDM)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003ePower\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eAC380V±10%, three-phases, 50\/60Hz, 7 kW\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 571.4px;\"\u003e\n\u003ctd style=\"height: 571.4px;\"\u003e\u003cem\u003eRotary ALD Machine Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 571.4px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eSS304 dual-vacuum chamber design \u003c\/li\u003e\n\u003cli\u003ePowder Container Volume: 0.33 L (two included), the recommended maximum loading volume ≤0.13L (For LiCoO2 as example, ~100 g). The rotation speed\" 0-60 rpm, adjustable\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e        \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYPCRALDM_05_100x100.png?v=1777487314\" alt=\"\" style=\"float: none;\" width=\"94\" height=\"94\"\u003e       \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYPCRALDM_03_100x100.png?v=1777485851\" alt=\"\" style=\"float: none;\"\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003eProcessing Temperature: RT-300 ℃\u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003ePrecursor: One 200 mL metal precursor bubbler with two channels; 4*50 mL precursor bubblers with single channel for metal- and oxidized sources. The heating temperature is RT-190 ℃. Two more connection ports are reserved for optional O3 or H2S precursors. \u003c\/li\u003e\n\u003cli\u003eSix fast-response ALD valves with heating temperature of RT-200℃. \u003c\/li\u003e\n\u003cli\u003eMFC: Max. 200 sccm\u003c\/li\u003e\n\u003cli\u003eVacuum gauge: one set with 100 Torr and one set with 1000 Torr to show the inner and outer chamber vacuum level. The ultimate vacuum is \u0026lt;0.1 Torr\u003c\/li\u003e\n\u003cli\u003eVacuum Pump with 17 m3\/h flow\u003c\/li\u003e\n\u003cli\u003eThe ALD parameters can be edited in the touch screen and the data can be recorded in real time. \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e          \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYPCRALDM_04_100x100.png?v=1777486932\" alt=\"\" style=\"float: none;\"\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003eThe alarm and safety lock are available for monitoring the temperature, pressure, and flow. \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 417.2px;\"\u003e\n\u003ctd style=\"height: 417.2px;\"\u003e\u003cem\u003e\u003cspan style=\"color: rgb(255, 42, 0);\"\u003eOptional\u003c\/span\u003e Features for Add-On (not included)\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 417.2px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eThe QCM unit can be added to monitor the growth rate and thickness in real time. Accuracy is 0.1 Å. The maximum measuring temperature is 200 ℃\u003c\/li\u003e\n\u003cli\u003eThe glovebox (O2\/H2O\u0026lt;1 ppm) can be integrated for precursor loading and transfer.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e            \u003cimg style=\"float: none;\" alt=\"\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYPCRALDM_06_100x100.png?v=1777487826\"\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003eCustomized substrate stack for holding multiple substrates (50*85 mm) can be supplied upon request.\u003c\/li\u003e\n\u003cli\u003eO3 generator with O2 flow meter can be supplied to replace the conventional H2O oxidant source. \u003c\/li\u003e\n\u003cli\u003eH2S gas flow channel can be added upon request. \u003c\/li\u003e\n\u003cli\u003eThe solid precursor bubbler with dual channels can be supplied upon request.\u003c\/li\u003e\n\u003cli\u003eThe RGA module can be added to analyze the gas residuals.\u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 67.2px;\"\u003e\n\u003ctd style=\"height: 67.2px;\"\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 67.2px;\"\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003eDimension\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eL1150 * W925 * H1850 mm\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003eWeight\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003e~350 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/pubs.aip.org\/avs\/jva\/article-abstract\/38\/5\/052403\/246727\/High-capacity-rotary-drum-for-atomic-layer?redirectedFrom=fulltext\"\u003eM. W. Coile, et al., High-capacity rotary drum for atomic layer deposition onto powders and small mechanical parts in a hot-walled viscous flow reactor, J. Vac. Sci. Technol. A, 2020, 38, 052403.\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S0040609025000574\"\u003eK. Seong, et al., Rotary-type atomic layer deposition of aluminum oxide coating on micropowder for secondary battery anode applications, Thin Solid Films, 2025, 817, 140656.\u003c\/a\u003e \u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/advanced.onlinelibrary.wiley.com\/doi\/abs\/10.1002\/admi.201800581\"\u003eS. Adhikari, et al., Progress in Powder Coating Technology Using Atomic Layer Deposition, Adv. Mater. Interfaces, 2018, 5, 1800581.\u003c\/a\u003e \u003c\/p\u003e","brand":"YMKJ","offers":[{"title":"Default Title","offer_id":47589236113638,"sku":"EYPCRALDM","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYPCRALDM_main.png?v=1777484663"},{"product_id":"eyctaldm","title":"ECS-Y Compact Thermal Atomic Layer Deposition (ALD) Machine (Sample: Max. 8\"), EYCTALDM","description":"\u003cp\u003eA thermal atomic layer deposition (ALD) machine is a precise thin-film coating system that deposits materials one atomic layer at a time using alternating, self-limiting chemical reactions at elevated temperatures (150-350 degrees). It ensures high conformality and atomic-scale thickness control, ideal for high-aspect-ratio 3D structures and, typically, for creating oxides, nitrides, and other thin films\u003c\/p\u003e\n\u003cp\u003eThe key components and features are: (1) \u003cstrong\u003eReaction Chamber\u003c\/strong\u003e: Heated, high-vacuum chamber where the substrate (up to 6–8 inches, typically) is held. (2) \u003cstrong\u003ePrecursor Delivery System\u003c\/strong\u003e: Multiple heated gas lines with MFCs (Mass Flow Controllers) allow for introducing alternating precursors (e.g., metal-organic precursors and H2O, or O3). (3) \u003cstrong\u003ePulse\/Purge Valves\u003c\/strong\u003e: High-speed, high-temperature valves, such as those found on the Veeco Savannah, control the precise, alternating dosage and inert gas purge cycles.\u003c\/p\u003e\n\u003cp\u003eThe mini benchtop thermal ALD has following unique features: (1) \u003cstrong\u003eThroughput\u003c\/strong\u003e: These systems are \"one-at-a-time.\" Coating a full roll of foil for a pilot line would require a Spatial ALD or Roll-to-Roll system, which are much larger than benchtop units. (2) \u003cstrong\u003ePrecursor Costs\u003c\/strong\u003e: While the amount used is tiny, specialized precursors (like those for solid-state electrolyte coatings) can be expensive. (3) \u003cstrong\u003eCycle Time\u003c\/strong\u003e: ALD is a slow process. Deposition of a 5-10 nm layer can take 1 to 2 hours depending on the cycle purge times.\u003c\/p\u003e\n\u003cp\u003eThe general working mechanism of the thermal ALD process are shown below:\u003c\/p\u003e\n\u003cdiv style=\"text-align: start;\"\u003e\u003cimg style=\"float: none;\" alt=\"\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYMBTALDM_02_100x100.png?v=1777409245\"\u003e\u003c\/div\u003e\n\u003ctable width=\"100%\" style=\"height: 764.4px;\"\u003e\n\u003ctbody\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eEYCTALDM (EY-CTALDM)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003ePower\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eAC380V±10%, three-phases, 50\/60Hz, 15 kW\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 341.6px;\"\u003e\n\u003ctd style=\"height: 341.6px;\"\u003e\u003cem\u003eALD Machine Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 341.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eMax. Sample: 8\" wafer (200mm*200mm)\u003c\/li\u003e\n\u003cli\u003eHeating Temperature for Sample Stage: RT-500 ℃\u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003ePrecursor: 3*50 mL precursor bubblers and one reaction channel are included. The heating temperature is RT-200 ℃. \u003c\/li\u003e\n\u003cli\u003eIt can be upgraded to six precursors and two reaction channels upon request.\u003c\/li\u003e\n\u003cli\u003eFour fast-response ALD valves with heating temperature of RT-200℃. \u003c\/li\u003e\n\u003cli\u003eMFC: Max. 200 sccm\u003c\/li\u003e\n\u003cli\u003eVacuum gauge: dual-grade, 0.0005 Torr -1000 Torr.\u003c\/li\u003e\n\u003cli\u003eVacuum Pump can support \u0026lt;5x10-3 Torr vacuum level\u003c\/li\u003e\n\u003cli\u003eThe ALD parameters can be edited in the individual touch screen and the data can be recorded in real time. \u003c\/li\u003e\n\u003cli\u003eThe alarm and safety lock are available for monitoring the temperature, pressure, and flow. \u003c\/li\u003e\n\u003cli\u003eThe deposition uniformity is \u0026gt;98% (take SnO2 as an example)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e          \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYCTALDM_02_100x100.png?v=1777491281\" alt=\"\" style=\"float: none;\"\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 165.2px;\"\u003e\n\u003ctd style=\"height: 165.2px;\"\u003e\u003cem\u003e\u003cspan style=\"color: rgb(255, 42, 0);\"\u003eOptional\u003c\/span\u003e Module for Add-On (not included)\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 165.2px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eThe QCM unit can be added to monitor the growth rate and thickness in real time. Accuracy is 0.1 Å. The maximum measuring temperature is 200 ℃\u003c\/li\u003e\n\u003cli\u003eO3 generator with O2 flow meter can be supplied to replace the conventional H2O oxidant source. \u003c\/li\u003e\n\u003cli\u003eThe plasma module can be upgraded to realize PEALD upon request. \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 67.2px;\"\u003e\n\u003ctd style=\"height: 67.2px;\"\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 67.2px;\"\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003eDimension\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eL1150 * W680 * H1050 mm\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003eWeight\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003e~400 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/advanced.onlinelibrary.wiley.com\/doi\/abs\/10.1002\/adem.201300132\"\u003eA. Cappella, et al., High Temperature Thermal Conductivity of Amorphous Al2O3 Thin Films Grown by Low Temperature ALD, Adv. Engineering Mater., 2013, 15, 1046-1050\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/onlinelibrary.wiley.com\/doi\/abs\/10.1002\/cvde.201207033\"\u003eS. E. Potts, et al., Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD, Chemical Vapor Deposition, 2013, 19, 125-133\u003c\/a\u003e. \u003c\/p\u003e","brand":"YSKJ","offers":[{"title":"Default Title","offer_id":47589347786982,"sku":"EYCTALDM","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYCTALDM_main.png?v=1777490895"},{"product_id":"eypealdm","title":"ECS-Y Plasma-Enhanced Atomic Layer Deposition (PEALD) Machine (Sample: Max. 8\"), EYPEALDM","description":"\u003cp\u003ePlasma-Enhanced Atomic Layer Deposition (PE-ALD) is an advanced variant of the ALD process that replaces thermal energy with highly reactive plasma species (radicals, ions, and electrons) to drive surface reactions. While thermal ALD relies on heating the substrate—often to temperatures between 200°C and 400°C—PE-ALD can achieve high-quality, dense films at much lower temperatures, sometimes even at room temperature.\u003c\/p\u003e\n\u003cp\u003eIn a standard thermal cycle, the second precursor (e.g., water or ammonia) requires thermal energy to react with the first precursor on the surface. In PE-ALD, a plasma discharge (typically O2, N2, or H2 plasma) generates reactive radicals that provide the necessary chemical energy.\u003c\/p\u003e\n\u003cp\u003eThe diagram of the working mechanism of the plasma-enhanced ALD process is shown below:\u003c\/p\u003e\n\u003cdiv style=\"text-align: start;\"\u003e\u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYPEALDM_02_160x160.png?v=1777492023\" style=\"margin-bottom: 16px; float: none;\"\u003e\u003c\/div\u003e\n\u003ctable style=\"height: 703.8px;\" width=\"100%\"\u003e\n\u003ctbody\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eEYPEALDM (EY-PEALDM)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003ePower\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eAC380V±10%, three-phases, 50\/60Hz, 18 kW\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 320.2px;\"\u003e\n\u003ctd style=\"height: 320.2px;\"\u003e\u003cem\u003eALD Machine Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 320.2px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eMax. Sample: 8\" wafer (200mm*200mm)\u003c\/li\u003e\n\u003cli\u003eHeating Temperature for Sample Stage: RT-500 ℃\u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003ePrecursor: 3*50 mL precursor bubblers and one reaction channel are included. The heating temperature is RT-200 ℃. \u003c\/li\u003e\n\u003cli\u003eIt can be upgraded to six precursors and two reaction channels upon request.\u003c\/li\u003e\n\u003cli\u003eFour fast-response ALD valves with heating temperature of RT-200℃. \u003c\/li\u003e\n\u003cli\u003eMFC: Max. 200 sccm\u003c\/li\u003e\n\u003cli\u003e\u003cspan style=\"color: rgb(255, 42, 0);\"\u003eRF power: 0-1000 W \u003c\/span\u003e\u003c\/li\u003e\n\u003cli style=\"color: rgb(255, 42, 0);\"\u003e\u003cspan style=\"color: rgb(255, 42, 0);\"\u003eThe plasma system can support four gas flows\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003eVacuum gauge: dual-grade, 0.0005 Torr -1000 Torr.\u003c\/li\u003e\n\u003cli\u003eVacuum Pump can support \u0026lt;5x10-3 Torr vacuum level\u003c\/li\u003e\n\u003cli\u003eThe ALD parameters can be edited in the individual touch screen and the data can be recorded in real time. \u003c\/li\u003e\n\u003cli\u003eThe alarm and safety lock are available for monitoring the temperature, pressure, and flow. \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 126px;\"\u003e\n\u003ctd style=\"height: 126px;\"\u003e\u003cem\u003eOptional Module for Add-On\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 126px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eThe QCM unit can be added to monitor the growth rate and thickness in real time. Accuracy is 0.1 Å. The maximum measuring temperature is 200 ℃\u003c\/li\u003e\n\u003cli\u003eO3 generator with O2 flow meter can be supplied to replace the conventional H2O oxidant source. \u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 67.2px;\"\u003e\n\u003ctd style=\"height: 67.2px;\"\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 67.2px;\"\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003eDimension\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eL1150 * W750 * H1450 mm\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003eWeight\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003e~500 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S0040609011004998\"\u003eHyungjun Kim, et al., Characteristics and applications of plasma enhanced-atomic layer deposition, Thin Solid Films, 2011, 519, 6639-6644\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/pubs.aip.org\/avs\/jva\/article-abstract\/38\/4\/040801\/246987\/The-role-of-plasma-in-plasma-enhanced-atomic-layer?redirectedFrom=fulltext\"\u003eD. R. Boris, et al., The role of plasma in plasma-enhanced atomic layer deposition of crystalline films, J. Vac. Sci. Technol. A, 2020, 38, 040801.\u003c\/a\u003e \u003c\/p\u003e","brand":"YSKJ","offers":[{"title":"Default Title","offer_id":47589365874918,"sku":"EYPEALDM","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYPEALDM_main.png?v=1777492584"},{"product_id":"epsbssmsc","title":"ECS-PS Benchtop Single-Source DC \u0026 RF Magnetron Sputtering Coater, EPSBSSMSC","description":"\u003cp\u003eA Benchtop DC \u0026amp; RF Magnetron Sputtering Coater is a versatile Physical Vapor Deposition (PVD) system designed for R\u0026amp;D environments. By integrating both Direct Current (DC) and Radio Frequency (RF) power sources, this single unit can deposit a wide array of materials, from conductive metals to insulating ceramics and oxides.\u003c\/p\u003e\n\u003cp\u003eIndustrial-grade benchtop models are designed for precision within a small footprint: (1) \u003cstrong\u003eMagnetron Sputtering Head\u003c\/strong\u003e: Uses strong magnets behind the target to trap electrons, increasing plasma density and allowing for lower operating pressures (10^{-3} to 10^{-2} mbar). (2) \u003cstrong\u003eChamber\u003c\/strong\u003e: Usually a high-purity stainless steel or quartz cylinder with a hinged lid for easy target swapping. (3) \u003cstrong\u003eSample Stage\u003c\/strong\u003e: Typically heatable (up to 500 ℃) and rotatable (1–20 RPM) to ensure the Al2O3 or ZnO coating is uniform across the entire electrode surface. (4) \u003cstrong\u003eGas Control\u003c\/strong\u003e: Uses Mass Flow Controllers (MFC) for Argon (sputtering gas) and sometimes Oxygen\/Nitrogen for \"Reactive Sputtering.\"  \u003c\/p\u003e\n\u003ctable width=\"100%\" style=\"height: 592.8px;\"\u003e\n\u003ctbody\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eEPSBSSMSC (EPS-BSSMSC)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003cem\u003ePower\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eAC220V±10%, single-phases, 50\/60Hz, 2000 W\u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 32.8px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 32.8px;\"\u003e\u003cem\u003eMagnetron Sputtering Sources\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 32.8px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eDC mode: 500 W for metal sputtering\u003c\/li\u003e\n\u003cli\u003eRF mode: 300 W, 14 kHz for non-metal sputtering\u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 263.2px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 263.2px;\"\u003e\u003cem\u003eMagnetron Sputtering Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 263.2px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eMagnetron Sputtering Head: 2\" head (1 unit for standard) with water cooling jackets. Multiple magnetron heads can be supplied upon request. \u003c\/li\u003e\n\u003cli\u003eThe shutter can be manually to open\/block the sputtering pathway\u003c\/li\u003e\n\u003cli\u003eSputtering target with Φ2\" x T1\/8\"\u003c\/li\u003e\n\u003cli\u003eSputtering Distance: 50-80 mm, adjustable. Sputtering Angle: 0-25\u003cspan\u003e°\u003c\/span\u003e\n\u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003eSample Stage Temperature: ≤350 ℃\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003eMechanical Vacuum Pump + Turbo Pump (\u003cspan style=\"color: rgb(255, 42, 0);\"\u003eOptional\u003c\/span\u003e): 5*10^(-5) Pa\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003eVacuum Chamber Size: Φ220×H340 mm \u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003eA Water chiller is included to cool down the cover flange.\u003c\/span\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 67.2px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 67.2px;\"\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 67.2px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 86.8px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 86.8px;\"\u003e\u003ci\u003eDimension\u003c\/i\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 86.8px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003eL600 × W600 × H1000 mm\u003c\/li\u003e\n\u003cli\u003eIt can be integrated with Ar-filled glovebox for air\/humidity-sensitive materials processing \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003ci\u003eWeight\u003c\/i\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003e~90 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e \u003c\/p\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S0378775315306662\"\u003eS. Lobe, et al., Radio frequency magnetron sputtering of Li7La3Zr2O12 thin films for solid-state batteries, Journal of Power Sources, 2016, 307, 684-689\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S2405829721001549\"\u003eY. Ma, et al., Materials and structure engineering by magnetron sputtering for advanced lithium batteries, Energy Storage Materials, 2021, 39, 203-224\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/advanced.onlinelibrary.wiley.com\/doi\/abs\/10.1002\/aenm.202403117\"\u003eY. Yao, et al., Prospective of Magnetron Sputtering for Interface Design in Rechargeable Lithium Batteries, Adv. Energy Mater., 2024, 14, 2403117\u003c\/a\u003e. \u003c\/p\u003e","brand":"PDZK","offers":[{"title":"DC","offer_id":47612688531686,"sku":"EPSBSSMSCDC","price":8888888.0,"currency_code":"USD","in_stock":true},{"title":"DC \u0026 RF","offer_id":47612688597222,"sku":"EPSBSSMSCDCRF","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EPSBSSMSC_main.png?v=1777664607"},{"product_id":"ebmszcvds","title":"ECS-B Mini Single-Zone Chemical Vapor Deposition (CVD) System (Max. 1200℃, 2\" Quartz Tube), EBMSZCVDS","description":"\u003cp\u003eA Single-Zone Chemical Vapor Deposition (CVD) System is a standard laboratory-scale furnace setup used to deposit high-quality thin films or nanomaterials (like graphene or carbon nanotubes) onto a substrate via chemical reactions of gaseous precursors. A single-zone system is optimized for uniform thermal processing within a specific \"hot zone\" in the center of the furnace tube.\u003c\/p\u003e\n\u003cp\u003eA standard single-zone CVD system consists of four primary modules: (1) \u003cstrong\u003eTube Furnace\u003c\/strong\u003e: A single-zone furnace (typically capable of 1100 ℃ to 1600 ℃ with a quartz or alumina tube. The heated length usually ranges from 200 mm to 600 mm, with a stable \"uniform zone\" in the center. (2) \u003cstrong\u003eGas Delivery System\u003c\/strong\u003e: A multi-channel manifold equipped with Mass Flow Controllers (MFCs) to precisely mix precursor gases (e.g., CH4, C2H2, H2, Ar). (3) \u003cstrong\u003eVacuum System\u003c\/strong\u003e: A mechanical pump or turbomolecular pump to maintain pressures from Atmospheric (APCVD) down to Low Pressure (LPCVD), typically around 10^{-2} to 10^{-3} mbar. (4) \u003cstrong\u003ePLC\/HMI Control\u003c\/strong\u003e: A digital interface to program temperature ramps, gas flow sequences, and pressure setpoints. \u003c\/p\u003e\n\u003ctable width=\"100%\" style=\"height: 1229.2px;\"\u003e\n\u003ctbody\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eEBMSZCVDS (EB-MSZCVDS)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003cem\u003ePower\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eAC220V±10%, single-phases, 50\/60Hz, 2000 W\u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 145.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 145.6px;\"\u003e\u003cem\u003eMain Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 145.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eMaximum Heating Temperature: 1200\u003cspan\u003e℃ (\u0026lt;30 min)\u003c\/span\u003e\n\u003c\/li\u003e\n\u003cli\u003eContinuously Operation Temperature: ≤1100℃\u003c\/li\u003e\n\u003cli\u003eRecommended Heating Rate: 20 ℃\/min (max. ≤100℃\/min)\u003c\/li\u003e\n\u003cli\u003eHeating Zone: 230 mm and constant temperature zone: 80 mm\u003c\/li\u003e\n\u003cli\u003eHeating Element: Resistance heating\u003c\/li\u003e\n\u003cli\u003eThermocouple: K-type\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 375.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 375.6px;\"\u003e\u003cem\u003eSpecific Furnace Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 375.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eMaterial: Al2O3 insulation material \u003c\/li\u003e\n\u003cli\u003eFurnace Dimension: L350*W290*H345 mm\u003c\/li\u003e\n\u003cli\u003eProcessing Tube: Quartz, Φ50 x 600mm\u003c\/li\u003e\n\u003cli\u003eStainless steel flanges with needle valve are equipped on upstream and downstream of quartz tube \u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003ePID temperature control and self-rectifying. 30 segments can be programmed for heating\/cooling. Over-temperature alarm is available for safety. \u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003eTemperature accuracy: ±1℃\u003c\/span\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003cspan\u003e          \u003c\/span\u003e\u003cimg style=\"margin-bottom: 16px; float: none;\" alt=\"\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EBMSZCVDS_02_100x100.png?v=1777683140\"\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003eStandard Package: 1 quartz tube, 1 set of sealing flange, 2 sets of silicone sealing gasket, alumina thermal blocks, 1 pair of high-temperature gloves, and 1 crucible hook. \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 120px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 120px;\"\u003e\u003cem\u003eGas Flow System Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 120px;\"\u003e\n\u003cul\u003e\n\u003cli\u003e\n\u003cspan style=\"color: rgb(255, 42, 0);\"\u003e100 sccm (Standard)\u003c\/span\u003e, 200 sccm, 500 sccm, and 1000 sccm are optional. \u003c\/li\u003e\n\u003cli\u003eFour channels with induvial control\u003c\/li\u003e\n\u003cli\u003eAccuracy: ±1.5%\u003c\/li\u003e\n\u003cli\u003eResponse Time: ≤10 Sec\u003c\/li\u003e\n\u003cli\u003ePressure Gap: 0.1-0.5 MPa. \u003c\/li\u003e\n\u003cli\u003eMax. Pressure: 3 MPa\u003c\/li\u003e\n\u003cli\u003eConnection Port: \u003cspan\u003eΦ6 (1\/4'')\u003c\/span\u003e\n\u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003eVacuum Gauge: -0.1 ~ 0.15 MPa\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003eStop Valve: Φ6\u003c\/span\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 184.8px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 184.8px;\"\u003e\u003cem\u003eVacuum System Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 184.8px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eVacuum Pump Power: AC220V, single phase 50\/60Hz, 400 W\u003c\/li\u003e\n\u003cli\u003eVacuum Speed: 10 m3\/h\u003c\/li\u003e\n\u003cli\u003eUltimate Vacuum: 0.5 Pa\u003c\/li\u003e\n\u003cli\u003eInlet\/Outlet Port: KF25\u003c\/li\u003e\n\u003cli\u003eHydraulic Oil: 1.1 L\u003c\/li\u003e\n\u003cli\u003eMotor Speed: 1440 rpm\u003c\/li\u003e\n\u003cli\u003eNosie Level: ≤56dB\u003c\/li\u003e\n\u003cli\u003eVacuum Gauge Measuring Range:  10^5～10^-1 Pa\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 145.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 145.6px;\"\u003e\u003cem\u003eNotes\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 145.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eThe relative pressure inside the quart tube should less than 0.02 MPa \u003c\/li\u003e\n\u003cli\u003eThe gas tank should be equipped with second-stage regulator to control the output pressure and avoid over-pressure. \u003c\/li\u003e\n\u003cli\u003eThe hazardous and flammable gases should be highly cautious, and the protections should be prepared before operation.   \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 67.2px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 67.2px;\"\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 67.2px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003ci\u003eDimension\u003c\/i\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003eL1600 × W900 × H600 mm\u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003ci\u003eWeight\u003c\/i\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003e~180 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e \u003c\/p\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S2211339814000872\"\u003eY. M. Chen, et al., CVD of carbon nanotubes in porous nickel for anodes in lithium ion battery, Current Opinion in Chemical Engineering, 2015, 7, 32-39\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/onlinelibrary.wiley.com\/doi\/full\/10.1002\/smll.202410570\"\u003eJ. Kim, et al., Advancements in Chemical Vapor Deposited Carbon Films for Secondary Battery Applications, Small, 2025, 21, 2410570\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/pubs.rsc.org\/en\/content\/articlelanding\/2015\/ee\/c5ee01254f\/unauth\"\u003eX. Wang, et al., Chemical vapor deposition and atomic layer deposition for advanced lithium ion batteries and supercapacitors, Energy Environ. Sci., 2015,8, 1889-1904.\u003c\/a\u003e \u003c\/p\u003e","brand":"BYK","offers":[{"title":"Default Title","offer_id":47614976196838,"sku":"EBMSZCVDS","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EBMSZCVDS_main.png?v=1777682972"},{"product_id":"ecessdcmsc","title":"ECS-C Economic Single-Source DC Magnetron Sputtering Coater, ECESSDCMSC","description":"\u003cp\u003eA Single-Source DC Magnetron Sputtering Coater is a streamlined Physical Vapor Deposition (PVD) system designed for depositing high-quality conductive thin films. Unlike multi-source or RF systems, this configuration is optimized for a single material target—typically a metal—making it the \"workhorse\" for creating current collectors, seed layers, and conductive contacts in battery research.\u003c\/p\u003e\n\u003cp\u003eAs for depositing metallic materials, Direct Current (DC) is the most efficient power source. (1) \u003cstrong\u003eHigh Deposition Rate\u003c\/strong\u003e: DC sputtering is significantly faster than RF sputtering for metals like Copper (Cu), Aluminum (Al), Titanium (Ti), and Gold (Au). (2) \u003cstrong\u003eSystem Simplicity\u003c\/strong\u003e: It does not require complex impedance matching networks, making it more reliable and easier to maintain in a busy R\u0026amp;D lab. (3) \u003cstrong\u003eCost-Effectiveness\u003c\/strong\u003e: Single-source DC units have a smaller footprint and lower power requirements, ideal for benchtop installation or integration into a single-chamber glovebox.\u003c\/p\u003e\n\u003ctable width=\"100%\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eECESSDCMSC (EC-ESSDCMSC)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePower\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eAC220V±10%, single-phases, 50\/60Hz, 2000 W\u003c\/li\u003e\n\u003cli\u003eDC power output is 500 W\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eSample Stage \u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eΦ100 mm\u003c\/li\u003e\n\u003cli\u003eHeating Temperature: RT-500 °C\u003c\/li\u003e\n\u003cli\u003eRotation Speed: Max. 20 rpm\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eSputtering Gun\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003e2\" \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eVacuum Chamber System\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eQuartz (Φ180mm*H200 mm) or SS304 (Φ194mm*H250 mm)\u003c\/li\u003e\n\u003cli\u003eVacuum Port: KF40; Ventilation Port: KF16\u003c\/li\u003e\n\u003cli\u003eVacuum Level: 0.3 Pa\u003c\/li\u003e\n\u003cli\u003eVacuum Pump Speed: 1.1 L\/s (turbo pump with 600 L\/s is available upon request).\u003c\/li\u003e\n\u003cli\u003eThe real-time film thickness gauge is available upon request (\u003cspan style=\"color: rgb(255, 42, 0);\"\u003enot included\u003c\/span\u003e).\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e            \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ECESSDCMSC_03_100x100.png?v=1777699830\" alt=\"\" style=\"float: none;\"\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eDimension\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eL550 × W350 × H400 mm\u003c\/li\u003e\n\u003cli\u003eIt can be integrated with Ar-filled glovebox for air\/humidity-sensitive materials processing \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eWeight\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003e~90 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S0378775315306662\"\u003eS. Lobe, et al., Radio frequency magnetron sputtering of Li7La3Zr2O12 thin films for solid-state batteries, Journal of Power Sources, 2016, 307, 684-689\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S2405829721001549\"\u003eY. Ma, et al., Materials and structure engineering by magnetron sputtering for advanced lithium batteries, Energy Storage Materials, 2021, 39, 203-224\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/advanced.onlinelibrary.wiley.com\/doi\/abs\/10.1002\/aenm.202403117\"\u003eY. Yao, et al., Prospective of Magnetron Sputtering for Interface Design in Rechargeable Lithium Batteries, Adv. Energy Mater., 2024, 14, 2403117\u003c\/a\u003e. \u003c\/p\u003e","brand":"CYKY","offers":[{"title":"Quartz","offer_id":47617811874022,"sku":"ECESSDCMSCQ","price":8888888.0,"currency_code":"USD","in_stock":true},{"title":"SS304","offer_id":47617811906790,"sku":"ECESSDCMSCSS","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ECESSDCMSC_01.png?v=1777699600"},{"product_id":"ecessteqc","title":"ECS-C Economic Single-Source Thermal Evaporator with Quartz Chamber, ECESSTEQC","description":"\u003cp\u003eAn Economic Single-Source Thermal Evaporator is the most cost-effective Physical Vapor Deposition (PVD) solution for depositing ultra-pure, low-melting-point metals and organic thin films. Unlike sputtering, which uses plasma, thermal evaporation uses resistive heating to \"boil\" the source material in a high vacuum, making it a \"gentle\" process ideal for delicate substrates like those used in Sodium-Ion (SIB) and Anode-Free research.\u003c\/p\u003e\n\u003cp\u003eIn a single-source configuration, the system is optimized for one material per run. This dramatically reduces the complexity of the power supply and the size of the vacuum chamber, leading to several \"economic\" advantages: (1) \u003cstrong\u003eLow Initial Investment\u003c\/strong\u003e: These systems are typically 30%–50% cheaper than multi-source or e-beam evaporators. (2) \u003cstrong\u003eMinimal Consumables\u003c\/strong\u003e: Uses inexpensive tungsten or molybdenum \"boats\" (20–50 each) as the heating element. (3) \u003cstrong\u003eEase of Use\u003c\/strong\u003e: Simple \"Set it and Forget it\" operation; no complex impedance matching or beam steering required.\u003c\/p\u003e\n\u003ctable width=\"100%\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eECESSTEQC (EC-ESSTEQC)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePower\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eAC220V±10%, single-phases, 50\/60Hz, 1500 W\u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eTechnical Parameters\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eEvaporation Voltage: 5 V\u003c\/li\u003e\n\u003cli\u003eEvaporation Current: 0-100 A, adjustable\u003c\/li\u003e\n\u003cli\u003eA tungsten crucible and basket\u003c\/li\u003e\n\u003cli\u003eSample Stage: Φ100 mm\u003c\/li\u003e\n\u003cli\u003eDistance between Sample and Evaporation Source: 60-100 mm, adjustable\u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003eVacuum Chamber: Quartz, Φ180mm*H200mm\u003c\/li\u003e\n\u003cli\u003eVacuum Port: KF25; Feeding Port: 1\/4\" double clamp\u003c\/li\u003e\n\u003cli\u003eUltimate Vacuum Level: 5*10^(-4) Torr with combined mechanical and turbo pump (\u003cspan style=\"color: rgb(255, 42, 0);\"\u003eoptional\u003c\/span\u003e)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eOptional Accessories\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eThe real-time film thickness gauge is available upon request (\u003cspan style=\"color: rgb(255, 42, 0);\"\u003enot included\u003c\/span\u003e).\u003c\/li\u003e\n\u003cli\u003eThickness Resolution: 0.0136 Å (Al). \u003c\/li\u003e\n\u003cli\u003eThickness Accuracy: ±0.5%\u003c\/li\u003e\n\u003cli\u003eMeasuring Speed: 100ms-1s\/time\u003c\/li\u003e\n\u003cli\u003eFrequency: 6 MHz, Φ14mm (flange CF35)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e            \u003cimg style=\"float: none;\" alt=\"\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ECESSDCMSC_03_100x100.png?v=1777699830\"\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eDimension\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eL600 × W600 × H700 mm\u003c\/li\u003e\n\u003cli\u003eIt can be integrated with Ar-filled glovebox for air\/humidity-sensitive materials processing \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eWeight\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003e~50 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003col class=\"cus-ref-zone__list\"\u003e\n\u003cli\u003e\u003ca href=\"https:\/\/advanced.onlinelibrary.wiley.com\/doi\/full\/10.1002\/aenm.202203256\" rel=\"noopener noreferrer\" target=\"_blank\"\u003eE. Adhitama, et al., On the Practical Applicability of the Li Metal-Based Thermal Evaporation Prelithiation Technique on Si Anodes for Lithium Ion Batteries, Adv. Energy Mater., 2023, 13, 2203256\u003c\/a\u003e\u003c\/li\u003e\n\u003cli\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/pii\/S2666248524000039\" rel=\"noopener noreferrer\" target=\"_blank\"\u003eL. Fallarino, et al., On the practical applicability of thermal evaporation technique to fabricate Na thin metal anodes for Na-metal batteries, Journal of Power Sources Advances, 2024, 26, 100137\u003c\/a\u003e\u003c\/li\u003e\n\u003cli\u003e\n\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/pii\/S0378775324011704\" rel=\"noopener noreferrer\" target=\"_blank\"\u003eB. Acebedo, et al., On the role of ultrathin lithium metal anodes produced by thermal evaporation, Journal of Power Sources, 2024, 618, 235218\u003c\/a\u003e. \u003c\/li\u003e\n\u003c\/ol\u003e","brand":"CYKY","offers":[{"title":"Default Title","offer_id":47618428240102,"sku":"ECESSTEQC","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ECESSTEQC_main.png?v=1777703631"},{"product_id":"ecetessc","title":"ECS-C Economic Single- or Dual-Source Thermal Evaporator with SS304 Chamber, ECETESSC","description":"\u003cp\u003eAn Economic Single- or Dual-Source Thermal Evaporator is the most cost-effective Physical Vapor Deposition (PVD) solution for depositing ultra-pure, low-melting-point metals and organic thin films. Unlike sputtering, which uses plasma, thermal evaporation uses resistive heating to \"boil\" the source material in a high vacuum, making it a \"gentle\" process ideal for delicate substrates like those used in Sodium-Ion (SIB) and Anode-Free research.\u003c\/p\u003e\n\u003cp\u003eIn a single- or dual-source configuration, the system is optimized for one or two material per run. This dramatically reduces the complexity of the power supply and the size of the vacuum chamber, leading to several \"economic\" advantages: (1) \u003cstrong\u003eLow Initial Investment\u003c\/strong\u003e: These systems are typically 30%–50% cheaper than multi-source or e-beam evaporators. (2) \u003cstrong\u003eMinimal Consumables\u003c\/strong\u003e: Uses inexpensive tungsten or molybdenum \"boats\" (20–50 each) as the heating element. (3) \u003cstrong\u003eEase of Use\u003c\/strong\u003e: Simple \"Set it and Forget it\" operation; no complex impedance matching or beam steering required.\u003c\/p\u003e\n\u003ctable width=\"100%\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eECETESSC (EC-ETESSC)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePower\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eAC220V±10%, single-phases, 50\/60Hz, 1500 W (single source); 2000 W (dual-source)\u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eTechnical Parameters\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eEvaporation Voltage: 5 V\u003c\/li\u003e\n\u003cli\u003eEvaporation Current: 0-100 A, adjustable\u003c\/li\u003e\n\u003cli\u003eA tungsten crucible and basket\u003c\/li\u003e\n\u003cli\u003eSample Stage: Φ100 mm\u003c\/li\u003e\n\u003cli\u003eDistance between Sample and Evaporation Source: 60-100 mm, adjustable\u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003eVacuum Chamber: \u003cspan style=\"color: rgb(255, 42, 0);\"\u003eSS304\u003c\/span\u003e, Φ194mm*H220mm\u003c\/li\u003e\n\u003cli\u003eObservation Window: Φ60mm\u003c\/li\u003e\n\u003cli\u003eVacuum Port: KF25; Feeding Port: KF16\u003c\/li\u003e\n\u003cli\u003eUltimate Vacuum Level: 5*10^(-4) Pa with combined mechanical (1.1 L\/s) and turbo pump (600 L\/s) (\u003cspan style=\"color: rgb(255, 42, 0);\"\u003eoptional\u003c\/span\u003e)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eOptional Accessories\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eThe real-time film thickness gauge is available upon request (\u003cspan style=\"color: rgb(255, 42, 0);\"\u003enot included\u003c\/span\u003e).\u003c\/li\u003e\n\u003cli\u003eThickness Resolution: 0.0136 Å (Al). \u003c\/li\u003e\n\u003cli\u003eThickness Accuracy: ±0.5%\u003c\/li\u003e\n\u003cli\u003eMeasuring Speed: 100ms-1s\/time\u003c\/li\u003e\n\u003cli\u003eFrequency: 6 MHz, Φ14mm (flange CF35)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e            \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ECESSDCMSC_03_100x100.png?v=1777699830\" alt=\"\" style=\"float: none;\"\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eDimension\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eL600 × W600 × H750 mm\u003c\/li\u003e\n\u003cli\u003eIt can be integrated with Ar-filled glovebox for air\/humidity-sensitive materials processing \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eWeight\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003e~80 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003col class=\"cus-ref-zone__list\"\u003e\n\u003cli\u003e\u003ca rel=\"noopener noreferrer\" href=\"https:\/\/advanced.onlinelibrary.wiley.com\/doi\/full\/10.1002\/aenm.202203256\" target=\"_blank\"\u003eE. Adhitama, et al., On the Practical Applicability of the Li Metal-Based Thermal Evaporation Prelithiation Technique on Si Anodes for Lithium Ion Batteries, Adv. Energy Mater., 2023, 13, 2203256\u003c\/a\u003e\u003c\/li\u003e\n\u003cli\u003e\u003ca rel=\"noopener noreferrer\" href=\"https:\/\/www.sciencedirect.com\/science\/article\/pii\/S2666248524000039\" target=\"_blank\"\u003eL. Fallarino, et al., On the practical applicability of thermal evaporation technique to fabricate Na thin metal anodes for Na-metal batteries, Journal of Power Sources Advances, 2024, 26, 100137\u003c\/a\u003e\u003c\/li\u003e\n\u003cli\u003e\n\u003ca rel=\"noopener noreferrer\" href=\"https:\/\/www.sciencedirect.com\/science\/article\/pii\/S0378775324011704\" target=\"_blank\"\u003eB. Acebedo, et al., On the role of ultrathin lithium metal anodes produced by thermal evaporation, Journal of Power Sources, 2024, 618, 235218\u003c\/a\u003e. \u003c\/li\u003e\n\u003c\/ol\u003e","brand":"CYKY","offers":[{"title":"Single-Source","offer_id":47619929407718,"sku":"ECETESSCSS","price":8888888.0,"currency_code":"USD","in_stock":true},{"title":"Dual-Source","offer_id":47619929440486,"sku":"ECETESSCDS","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ECETESSC_01.png?v=1777709485"},{"product_id":"ecs-b-mini-single-zone-chemical-vapor-deposition-cvd-system-max-1200-2-quartz-tube-ebmszcvds-copy","title":"ECS-N Mist Chemical Vapor Deposition (CVD) System (Max. 1200℃, 2\" Quartz Tube) for Thin Film Coating, ENMCVDS","description":"\u003cp\u003eMist Chemical Vapor Deposition (Mist CVD) (also named Ultrasonic Spray Pyrolysis) is a solution-based thin-film deposition technique that operates at atmospheric pressure, making it a highly cost-effective and energy-efficient alternative to traditional vacuum-based CVD. By atomizing liquid precursors into a fine aerosol (mist), this method allows you to deposit high-quality, conformal functional films onto complex surfaces—ideal for protecting sensitive battery materials like NFPP and NMC.\u003c\/p\u003e\n\u003cp\u003eMist CVD bridges the gap between liquid-phase processing and gas-phase deposition. (1) \u003cstrong\u003eAtomization\u003c\/strong\u003e: An ultrasonic transducer (typically 1.6–2.4 MHz) creates a fine mist of droplets (usually 1–3 um in diameter) from a liquid precursor solution. (2) \u003cstrong\u003eTransportation\u003c\/strong\u003e: A carrier gas (N2, Ar, or air) carries the mist into a heated reaction zone. (3) \u003cstrong\u003eLeidenfrost Effect\u003c\/strong\u003e: As the mist reaches the heated substrate (typically 200℃ to 500℃, a vapor cushion forms beneath the droplets. This prevents the droplets from \"splashing\" and ensures they decompose chemically near or on the surface. (4) \u003cstrong\u003eConformal Film Growth\u003c\/strong\u003e: The precursor decomposes to form a solid film, while solvent vapors and byproducts are swept away by the exhaust.\u003c\/p\u003e\n\u003ctable width=\"100%\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eENMCVDS (EN-MCVDS)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eUltrasonic Mist Generation System\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003ePower: AC220V±10%, single-phases, 50\/60Hz, 55 W (Atomizer: 35 W, Peristaltic Pump: 20W)\u003c\/li\u003e\n\u003cli\u003eFrequency: 2.4 MHz\u003c\/li\u003e\n\u003cli\u003ePeristaltic Pump Flow Rate: 9 mL\/min, I.D. Φ2 * T1mm\u003c\/li\u003e\n\u003cli\u003eGas Flow Meter: 0.5-8 L\/min\u003c\/li\u003e\n\u003cli\u003eTank Volume: 160 mL\u003c\/li\u003e\n\u003cli\u003eMist Droplet Size: 5-10 um\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eCVD Tube Furnace Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eAC220V±10%, single-phases, 50\/60Hz, 1200 W\u003c\/li\u003e\n\u003cli\u003eMaximum Heating Temperature: 1200℃ (\u0026lt;30 min)\u003c\/li\u003e\n\u003cli\u003eContinuously Operation Temperature: ≤1150℃\u003c\/li\u003e\n\u003cli\u003eRecommended Heating Rate: 10 ℃\/min\u003c\/li\u003e\n\u003cli\u003eFurnace Hearth: Φ80×200mm\u003c\/li\u003e\n\u003cli\u003eFurnace Tube: Quartz, Φ50*600mm\u003c\/li\u003e\n\u003cli\u003eHeating Element: Resistance heating type\u003c\/li\u003e\n\u003cli\u003eThermocouple: K-type\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eNotes\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eThe door is not allowed to be opened when the furnace temperature higher than 300 ℃\u003c\/li\u003e\n\u003cli\u003eThe relative pressure inside the quart tube should less than 0.125 MPa \u003c\/li\u003e\n\u003cli\u003eUnder high vacuum (10-3 torr) operation, the temperature should less than 800℃\u003c\/li\u003e\n\u003cli\u003eThe hazardous and flammable gases should be highly cautious, and the protections should be prepared before operation.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eDimension\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eL800 × W400 × H300 mm\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eWeight\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003e~40 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/iopscience.iop.org\/article\/10.1088\/1361-6528\/ac30f4\/meta\"\u003eA. Kuddus, et al., Mist chemical vapor deposition of crystalline MoS2 atomic layer films using sequential mist supply mode and its application in field-effect transistors, Nanotrchnology, 2022, 33, 045601.\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/pubs.acs.org\/doi\/abs\/10.1021\/acsami.7b04235\"\u003eJ. Park, et al., High-Performance Zinc Tin Oxide Semiconductor Grown by Atmospheric-Pressure Mist-CVD and the Associated Thin-Film Transistor Properties, ACS Appl. Mater. Interfaces 2017, 9, 24, 20656–20663\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S2542529324002803\"\u003eS. Yao, et al., Mist CVD technology for gallium oxide deposition: A review, Materials Today Physics, 2024, 49, 101604.\u003c\/a\u003e \u003c\/p\u003e","brand":"NBD","offers":[{"title":"Default Title","offer_id":47622803259622,"sku":"ENMCVDS","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ENMCVDS_main.png?v=1777746579"},{"product_id":"enrcvdfafr","title":"ECS-N Rotary CVD Furnace (Max. 1200℃, 4\" Quartz Tube) with Automatic Feeder \u0026 Receiver for Continuous Powder Coating, ENRCVDFAFR","description":"\u003cp\u003eA Rotary CVD Furnace with an Automatic Feeder and Receiver is a specialized system designed for the continuous, uniform coating of powders (such as battery cathode\/anode active materials). In a standard tube furnace, powders often agglomerate, leaving the center of the pile uncoated. This system uses a rotating tube to \"tumble\" the particles, ensuring every grain is exposed to the precursor gases.\u003c\/p\u003e\n\u003cp\u003eThe integration of an automatic feeder and receiver transforms a batch process into a semi-continuous or fully continuous production line. (1) \u003cstrong\u003eAutomatic Feeder (Inlet)\u003c\/strong\u003e: Typically a Vibratory or Screw (Volumetric) Feeder. It meters the raw powder into the rotating tube at a precise rate (0–100 mL\/min), preventing clumping at the entrance. (2) \u003cstrong\u003eRotating Reaction Tube\u003c\/strong\u003e: A quartz or stainless steel tube with internal \"flaps\" or \"baffles.\" As the tube rotates (0–20 RPM), the flaps lift and drop the powder through the precursor gas stream. (3) \u003cstrong\u003eTilt Mechanism\u003c\/strong\u003e: The entire furnace can be tilted (0\u003cspan\u003e°\u003c\/span\u003e to 25\u003cspan\u003e°\u003c\/span\u003e). Gravity, combined with rotation, moves the powder from the feeder end to the receiver end. (4) \u003cstrong\u003eAutomatic Receiver (Outlet)\u003c\/strong\u003e: A sealed, vacuum-tight container that collects the coated powder. In 2026 models, these are often Atmosphere-Protected, allowing you to collect air-sensitive materials (like sodium-ion precursors) without oxidation.\u003c\/p\u003e\n\u003ctable width=\"100%\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eENRCVDFAFR (EN-RCVDFAFR)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eGeneral Key Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003ePID Temperature Control with high accuracy and stability\u003c\/li\u003e\n\u003cli\u003eRotation and vibration functions\u003c\/li\u003e\n\u003cli\u003eAutomatic powder feeding and coated sample discharge\u003c\/li\u003e\n\u003cli\u003eEnvironmental Control: multiple gas types (N2, Ar, H2) and vacuum can be conducted. \u003c\/li\u003e\n\u003cli\u003eHMI touch screen for easy setting and control \u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eRotary CVD Furnace Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eAC380V±10%, three-phases, 50\/60Hz, 4500 W\u003c\/li\u003e\n\u003cli\u003eMaximum Heating Temperature: 1200℃ (\u0026lt;30 min)\u003c\/li\u003e\n\u003cli\u003eContinuously Operation Temperature: ≤1100℃\u003c\/li\u003e\n\u003cli\u003eThermocouple: K-type (φ2*420mm)\u003c\/li\u003e\n\u003cli\u003eHeating Rate: Max. 20 ℃\/min\u003c\/li\u003e\n\u003cli\u003eFurnace Hearth: Φ150×440mm (dual-zones, 220mm+220 mm)\u003c\/li\u003e\n\u003cli\u003eFurnace Tube: Quartz, central Φ100*380mm (two side is Φ60*1000mm)\u003c\/li\u003e\n\u003cli style=\"color: rgb(255, 42, 0);\"\u003e\u003cspan style=\"color: rgb(255, 42, 0);\"\u003eTilt Angle: -5° to 20°\u003c\/span\u003e\u003c\/li\u003e\n\u003cli style=\"color: rgb(0, 0, 0);\"\u003e\u003cspan style=\"color: rgb(0, 0, 0);\"\u003eTube Rotation Speed: 1-10 rpm\u003c\/span\u003e\u003c\/li\u003e\n\u003cli style=\"color: rgb(0, 0, 0);\"\u003e\u003cspan style=\"color: rgb(0, 0, 0);\"\u003ePowder Feeding Speed: 1-25 mL\/min (powder size\u0026lt;D0.1 mm)\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003eFlow Meter: 0.1-0.8 L\/min\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eNotes\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eThe door is not allowed to be opened when the furnace temperature higher than 300 ℃\u003c\/li\u003e\n\u003cli\u003eThe relative pressure inside the quart tube should less than 0.125 MPa \u003c\/li\u003e\n\u003cli\u003eUnder high vacuum (10-3 torr) operation, the temperature should less than 800℃\u003c\/li\u003e\n\u003cli\u003eThe hazardous and flammable gases should be highly cautious, and the protections should be prepared before operation.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eDimension\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eL1760 × W800 × H1690 mm\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eWeight\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003e~270 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/pubs.rsc.org\/en\/content\/articlelanding\/2009\/jm\/b911109c\/unauth\"\u003eV. D. Santo, et al., Tailored supported metal nanoparticles by CVD: an easy and efficient scale-up by a rotary bed OMCVD device, J. Mater. Chem., 2009,19, 9030-9037\u003c\/a\u003e.\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S0272884222021356\"\u003eS. Tu, et al., Parametric investigation of in-situ synthesis of carbon nanotubes on Al2O3 powder by the rotary chemical vapor deposition method, Ceramics International, 2022, 48, 28258-28267\u003c\/a\u003e \u003c\/p\u003e","brand":"NBD","offers":[{"title":"Default Title","offer_id":47622850674918,"sku":"ENRCVDFAFR","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ENRCVDFAFR_main.png?v=1777751089"},{"product_id":"enr2r3zcvdf","title":"ECS-N Roll-to-Roll Three-Zones CVD Furnace (Max. 1200℃, 4\" Quartz Tube) for 2D Material Synthesis, ENR2R3ZCVDF","description":"\u003cp\u003eA Roll-to-Roll (R2R) CVD Furnace is the industrial gateway to mass-producing 2D materials like Graphene, Hexagonal Boron Nitride (h-BN), and Transition Metal Dichalcogenides (TMDs). Unlike batch furnaces, R2R systems continuously move a flexible substrate—typically copper or nickel foil—through a multi-zone heating chamber, allowing for the synthesis of 2D materials at meters-per-minute scales.\u003c\/p\u003e\n\u003cp\u003eA professional R2R CVD platform consists of three integrated modules: (1) \u003cstrong\u003eUnwinding Chamber\u003c\/strong\u003e: Holds the source roll (e.g., 25 um Copper foil). It features tension control to prevent the thin foil from wrinkling or tearing during high-temperature processing. (2) \u003cstrong\u003eMulti-Zone Reaction Furnace\u003c\/strong\u003e: A long horizontal tube with multiple independent heating zones (1000℃ to 1200℃). This allows for a precise thermal profile: (a) Zone 1: Annealing\/Pre-treatment (cleaning the foil surface). (b) Zone 2: Growth (introducing precursors like CH4 for graphene). (c) Zone 3: Controlled Cooling (crucial for maintaining crystal orientation). (3) \u003cstrong\u003eRewinding Chamber\u003c\/strong\u003e: Collects the finished material. In 2026 systems, this chamber is often vacuum-sealed or Ar-backfilled to prevent the freshly grown 2D layer from oxidizing.\u003c\/p\u003e\n\u003ctable width=\"100%\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eENR2R3ZCVDF (EN-R2R3ZCVDF)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eGeneral Key Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eContinuous synthesis of 2D material with high efficiency\u003c\/li\u003e\n\u003cli\u003eSupport multiple vapor-deposition techniques and tandem processes integration\u003c\/li\u003e\n\u003cli\u003eVarious 2D materials, such as graphene, TMDs, hBN, MXene, can be synthesized with high flexibility\u003c\/li\u003e\n\u003cli\u003eDifferent flexible substrates can be used for vapor deposition\u003c\/li\u003e\n\u003cli\u003eHMI touch screen for easy setting and control \u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eR2R CVD Furnace System\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eAC380V±10%, three-phases, 50\/60Hz, 10 kW\u003c\/li\u003e\n\u003cli\u003eMaximum Heating Temperature: 1200℃ (\u0026lt;30 min)\u003c\/li\u003e\n\u003cli\u003eContinuously Operation Temperature: ≤1100℃\u003c\/li\u003e\n\u003cli\u003eThermocouple: K-type (φ2*420mm)\u003c\/li\u003e\n\u003cli\u003eRecommended Heating Rate: \u003cspan\u003e≤\u003c\/span\u003e10 ℃\/min\u003c\/li\u003e\n\u003cli\u003eFurnace Hearth: Φ150×800mm (three-zones, 200+400+200 mm)\u003c\/li\u003e\n\u003cli\u003eFurnace Tube: Quartz, Φ100*1600*3mm\u003c\/li\u003e\n\u003cli\u003eFour Channel Flow Meter: 1st-3rd channel: 1000 sccm; 4th channel: 3000 sccm; φ6.35 double clamp\u003c\/li\u003e\n\u003cli\u003eVacuum Pump: ≥4.4L\/s, 13-12000 Pa, ultimate vacuum \u0026lt;5*10^(-2) torr. \u003c\/li\u003e\n\u003cli\u003eR2R Unit: Copper foil roll (2 kg, W80mm, T0.04 mm), web speed is 1-100 mm\/min, adjustable\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eNotes\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eThe door is not allowed to be opened when the furnace temperature higher than 300 ℃\u003c\/li\u003e\n\u003cli\u003eThe relative pressure inside the quart tube should less than 0.125 MPa \u003c\/li\u003e\n\u003cli\u003eUnder high vacuum (10-3 torr) operation, the temperature should less than 800℃\u003c\/li\u003e\n\u003cli\u003eThe hazardous and flammable gases should be highly cautious, and the protections should be prepared before operation.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eDimension\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eL2700 × W900 × H1400 mm\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eWeight\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003e~530 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/pubs.rsc.org\/en\/content\/articlelanding\/2009\/jm\/b911109c\/unauth\"\u003eV. D. Santo, et al., Tailored supported metal nanoparticles by CVD: an easy and efficient scale-up by a rotary bed OMCVD device, J. Mater. Chem., 2009,19, 9030-9037\u003c\/a\u003e.\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S0272884222021356\"\u003eS. Tu, et al., Parametric investigation of in-situ synthesis of carbon nanotubes on Al2O3 powder by the rotary chemical vapor deposition method, Ceramics International, 2022, 48, 28258-28267\u003c\/a\u003e \u003c\/p\u003e","brand":"NBD","offers":[{"title":"Default Title","offer_id":47622890160358,"sku":"ENR2R3ZCVDF","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ENR2R3ZCVDF_main.png?v=1777759183"},{"product_id":"enfbcvdf","title":"ECS-N Fluidized Bed Chemical Vapor Deposition (FBCVD) Furnace (Max. 1200℃, 2\" Quartz Tube) for Powder Coating, ENFBCVDF","description":"\u003cp\u003eA Fluidized Bed Chemical Vapor Deposition (FB-CVD) Furnace is the premium hardware solution for the uniform, high-throughput coating of micro- and nano-powders. Unlike rotary or static furnaces, FB-CVD suspends the particles in an upward stream of precursor gas, turning the entire powder bed into a \"fluid.\"\u003c\/p\u003e\n\u003cp\u003eThe core of the system is the Gas Distributor (typically a porous quartz or metal frit) at the bottom of a vertical furnace tube. (1) \u003cstrong\u003eGas Entrance\u003c\/strong\u003e: Precursor and carrier gases (CH4, Ar, H2) enter from the bottom. (2) \u003cstrong\u003eFluidization\u003c\/strong\u003e: When the gas velocity reaches the \"Minimum Fluidization Velocity\" (Umf), the aerodynamic drag counteracts the weight of the particles. The bed expands, and particles begin to move turbulently. (3) \u003cstrong\u003eUniform Reaction\u003c\/strong\u003e: Every single particle is surrounded by the precursor gas. This eliminates the \"shielding effect\" found in tray-based furnaces, ensuring 100% conformal coating across the entire batch.  Heat Transfer: Fluidized beds have exceptionally high heat transfer coefficients, preventing \"hot spots\" that could cause phase changes in delicate SIB cathodes.\u003c\/p\u003e\n\u003ctable width=\"100%\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eENFBCVDF (EN-FBCVDF)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eGeneral Key Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eFluidized Bed Tech: The gas was feed through a distribution plate at the bottom and from fluidized status, which makes the suspension particles uniformly heated. \u003c\/li\u003e\n\u003cli\u003eThe vertical tube structure with appropriate inner space for small amount sample treatment\u003c\/li\u003e\n\u003cli\u003eMultiple gases and vacuum condition can be supplied for various experiments\u003c\/li\u003e\n\u003cli\u003eHMI touch screen for easy setting and control \u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eFluidized Bed CVD Furnace Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eAC380V±10%, three-phases, 50\/60Hz, 1200 W (single-zone), 2.4 kW (dual-zones), 8.0 kW (three-zones)\u003c\/li\u003e\n\u003cli\u003eMaximum Heating Temperature: 1200℃ (\u0026lt;30 min)\u003c\/li\u003e\n\u003cli\u003eContinuously Operation Temperature: ≤1150℃\u003c\/li\u003e\n\u003cli\u003eHeating Element: Mo-doped Fe-Cr-Al\u003c\/li\u003e\n\u003cli\u003eThermocouple: K-type (φ2*420mm)\u003c\/li\u003e\n\u003cli\u003eRecommended Heating Rate: ≤10 ℃\/min\u003c\/li\u003e\n\u003cli\u003eFurnace Hearth: Φ80 * 200mm (single-zone), Φ80 * 400mm (200+200 mm, dual-zones), Φ80 * 800mm (200+400+200mm, three zones)\u003c\/li\u003e\n\u003cli\u003eFurnace Tube: Quartz, central Φ50*600-1400mm, Quartz frit is inside for loading powder sample and gas flow.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e          \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ENFBCVDF_05_160x160.png?v=1777765048\" alt=\"\" style=\"float: none;\"\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eNotes\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eThe door is not allowed to be opened when the furnace temperature higher than 300 ℃\u003c\/li\u003e\n\u003cli\u003eThe relative pressure inside the quart tube should less than 0.125 MPa \u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003eThe hazardous and flammable gases should be highly cautious, and the protections should be prepared before operation.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eDimension\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eL400 × W350 × H1200 mm (single-zone)\u003c\/li\u003e\n\u003cli\u003eL470 × W350 × H1250 mm (dual-zones)\u003c\/li\u003e\n\u003cli\u003eL1100 × W670 × H1970 mm (triple-zones)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eWeight\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003e~35 kg (single-zone)\u003c\/li\u003e\n\u003cli\u003e~47 kg (dual-zones)\u003c\/li\u003e\n\u003cli\u003e~260 kg (triple-zones)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/pii\/S2666821123001114\"\u003eS. Aslam, et al., A new route to apply nanometric alumina coating on powders by fluidized bed chemical vapor deposition, Chemical Engineering Journal Advances, 2023,16, 100554\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.mdpi.com\/2079-6412\/15\/3\/322\"\u003eB. Li, et al., The Fluidized Bed-Chemical Vapor Deposition Coating Technology of Micro-Nano Particles: Status and Prospective, Coatings 2025, 15(3), 322\u003c\/a\u003e \u003c\/p\u003e","brand":"NBD","offers":[{"title":"Singe-Zone","offer_id":47622954877158,"sku":"ENFBCVDFSZ","price":8888888.0,"currency_code":"USD","in_stock":true},{"title":"Dual-Zones","offer_id":47622954909926,"sku":"ENFBCVDFDZ","price":8888888.0,"currency_code":"USD","in_stock":true},{"title":"Triple-Zones","offer_id":47622954942694,"sku":"ENFBCVDFTZ","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ENFBCVDF_02.png?v=1777763897"},{"product_id":"enfbcvdfafmg","title":"ECS-N Fluidized Bed Chemical Vapor Deposition (FBCVD) Furnace (Max. 1200℃, Triple-Zones) with Automatic Feeder and Mist Generator for Powder Coating, ENFBCVDFAFMG","description":"\u003cp\u003eA Fluidized Bed Chemical Vapor Deposition (FBCVD) Furnace with an Automatic Feeder and Mist Generator is a sophisticated, integrated platform designed for the core-shell coating of powders. In this setup, the \"fluidization\" ensures every particle is suspended in a gas stream, while the \"mist generator\" introduces liquid precursors as an aerosol, allowing for the deposition of high-quality oxides, polymers, or metals at atmospheric or low pressure.\u003c\/p\u003e\n\u003cp\u003eThis \"3-in-1\" system (Fluidization + Automatic Feeding + Mist Generation) eliminates the manual handling of powders and precursors, ensuring high repeatability for large R\u0026amp;D projects. (1) \u003cstrong\u003eAutomatic Solid Feeder\u003c\/strong\u003e: Typically a volumetric screw feeder or a vibratory feeder. It precisely meters the raw cathode\/anode powder into the furnace at rates like 1–100 mL\/min. (2) \u003cstrong\u003eUltrasonic Mist Generator\u003c\/strong\u003e: Uses a high-frequency transducer (1.7 MHz to 2.4 MHz) to atomize liquid solutions into a sub-micron mist. This mist is then carried by an inert gas (Ar) into the fluidized bed. (3) \u003cstrong\u003eVertical Fluidized Bed Furnace\u003c\/strong\u003e: A vertical tube furnace where the powder is suspended in the mist\/gas mixture. The \"fluid\" state allows the mist to surround each particle uniformly.  Automatic Receiver\/Cyclone: A collection system at the top of the furnace that uses a cyclone separator to capture the coated powder while letting exhaust gases escape.\u003c\/p\u003e\n\u003ctable width=\"100%\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eENFBCVDFAFMG (EN-FBCVDFAFMG)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eGeneral Key Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eFluidized Bed Tech: The gas was feed through a distribution plate at the bottom and from fluidized status, which makes the suspension particles uniformly heated and coated. \u003c\/li\u003e\n\u003cli\u003eThe powders are continuously feed with auger and gas-pressure transport.  \u003c\/li\u003e\n\u003cli\u003eHigh efficiency cyclone for coated powder collection \u003c\/li\u003e\n\u003cli\u003eThe ultrasonic mist generator enable fine droplet as precursor for pyrolysis and ultrathin coating. \u003c\/li\u003e\n\u003cli\u003eHMI touch screen for easy setting and control \u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eFluidized Bed CVD Furnace Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eAC380V±10%, three-phases, 50\/60Hz, 9 kW\u003c\/li\u003e\n\u003cli\u003eMaximum Heating Temperature: 1200℃ (\u0026lt;30 min)\u003c\/li\u003e\n\u003cli\u003eContinuously Operation Temperature: ≤1100℃\u003c\/li\u003e\n\u003cli\u003eThermocouple: K-type (φ2*420mm)\u003c\/li\u003e\n\u003cli\u003eRecommended Heating Rate: ≤10 ℃\/min\u003c\/li\u003e\n\u003cli\u003eFurnace Hearth: Φ150×900mm (300+300+300, three-zones)\u003c\/li\u003e\n\u003cli\u003eFurnace Tube: (1) Gradient quartz tube Φ50-Φ80*1300*3mm, side Φ20; (2) Gradient quartz tube with frit plate: Φ20-Φ40*450 (200 mesh frit)\u003c\/li\u003e\n\u003cli\u003eFour Channel Gas Flow: (1) H2: 1000 sccm; (2) N2: 1000 sccm; (3) CO: 2000 sccm; (4) Propylene: 3000 sccm. φ6.35 double-clamp\u003c\/li\u003e\n\u003cli\u003eUltrasonic Mist Generator: 55 W, peristaltic pump: 11-13 mL\/min, flow meter: 0.3-3 L\/min; Tank: 360 mL; Atomized Droplet: 5-10 um, Atomized Amount: 0.4 mL\/min\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e          \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ENFBCVDFAFMG_02_160x160.png?v=1777768324\" alt=\"\" style=\"float: none;\"\u003e \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ENFBCVDFAFMG_03_100x100.png?v=1777768324\" alt=\"\" style=\"float: none;\"\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eNotes\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eThe door is not allowed to be opened when the furnace temperature higher than 300 ℃\u003c\/li\u003e\n\u003cli\u003eThe relative pressure inside the quart tube should less than 0.125 MPa \u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003eThe hazardous and flammable gases should be highly cautious, and the protections should be prepared before operation.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eDimension\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eL1100 × W650 × H2400 mm\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eWeight\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003e~240 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/pii\/S2666821123001114\"\u003eS. Aslam, et al., A new route to apply nanometric alumina coating on powders by fluidized bed chemical vapor deposition, Chemical Engineering Journal Advances, 2023,16, 100554\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.mdpi.com\/2079-6412\/15\/3\/322\"\u003eB. Li, et al., The Fluidized Bed-Chemical Vapor Deposition Coating Technology of Micro-Nano Particles: Status and Prospective, Coatings 2025, 15(3), 322\u003c\/a\u003e \u003c\/p\u003e","brand":"NBD","offers":[{"title":"Default Title","offer_id":47622947274982,"sku":"ENFBCVDFAFMG","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ENFBCVDFAFMG_main.png?v=1777767935"},{"product_id":"enfbcvdfafr","title":"ECS-N Fluidized Bed Chemical Vapor Deposition (FBCVD) Furnace (Max. 1200℃, Dual-Zones) with Automatic Feeder and Receiver for Powder Coating, ENFBCVDFAFR","description":"\u003cp\u003eA Fluidized Bed Chemical Vapor Deposition (FBCVD) Furnace with an Automatic Feeder and Receiver is a specialized reactor system designed for the uniform, high-throughput coating of micro- and nano-sized powders. By integrating continuous material handling (feeding and receiving) with a fluidized bed, this system transforms a traditional batch process into a semi-continuous or fully continuous production line.\u003c\/p\u003e\n\u003cp\u003eThis \"2-in-1\" system (Fluidization + Automatic Feeding \u0026amp; Collection) eliminates the manual handling of powders and precursors, ensuring high repeatability for large R\u0026amp;D projects. (1) \u003cstrong\u003eAutomatic Solid Feeder\u003c\/strong\u003e: Typically a volumetric screw feeder or a vibratory feeder. It precisely meters the raw cathode\/anode powder into the furnace at rates like 1–100 mL\/min. (2) \u003cstrong\u003eVertical Fluidized Bed Furnace\u003c\/strong\u003e: A vertical tube furnace where the powder is suspended in the mist\/gas mixture. The \"fluid\" state allows the mist to surround each particle uniformly. (3) \u003cstrong\u003eAutomatic Receiver\/Cyclone\u003c\/strong\u003e: A collection system at the top of the furnace that uses a cyclone separator to capture the coated powder while letting exhaust gases escape.\u003c\/p\u003e\n\u003ctable width=\"100%\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eENFBCVDFAFR (EN-FBCVDFAFR)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eGeneral Key Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eFluidized Bed Tech: The gas was feed through a distribution plate at the bottom and from fluidized status, which makes the suspension particles uniformly heated and coated. \u003c\/li\u003e\n\u003cli\u003eThe powders are continuously feed with auger and gas-pressure transport.  \u003c\/li\u003e\n\u003cli\u003eHigh efficiency cyclone for coated powder collection  \u003c\/li\u003e\n\u003cli\u003eHMI touch screen for easy setting and control \u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eFluidized Bed CVD Furnace Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eAC380V±10%, three-phases, 50\/60Hz, 8 kW\u003c\/li\u003e\n\u003cli\u003eMaximum Heating Temperature: 1200℃ (\u0026lt;30 min)\u003c\/li\u003e\n\u003cli\u003eContinuously Operation Temperature: ≤1150℃\u003c\/li\u003e\n\u003cli\u003eHeating Element: Mo-doped Fe-Cr-Al alloy\u003c\/li\u003e\n\u003cli\u003eThermocouple: K-type (φ2*420mm)\u003c\/li\u003e\n\u003cli\u003eHeating Rate: ≤20 ℃\/min\u003c\/li\u003e\n\u003cli\u003eFurnace Hearth: Φ150×600mm (300+300, dual-zones)\u003c\/li\u003e\n\u003cli\u003eFurnace Tube: (1) Gradient quartz tube Φ50-Φ80*1300*3mm, side Φ20; (2) Gradient quartz tube with frit plate: Φ20-Φ40*450 (200 mesh frit)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e           \u003cimg style=\"float: none;\" alt=\"\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ENFBCVDFAFR_06_100x100.png?v=1777785944\"\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003eFour Channel Gas Flow: (1) H2: 1000 sccm; (2) N2: 1000 sccm; (3) CO: 2000 sccm; (4) Propylene: 3000 sccm. φ6.35 double-clamp\u003c\/li\u003e\n\u003cli\u003eThe sealing flange with water-cooling function, high efficiency cyclone unit, and automatic powder feeder are shown below:\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e          \u003cimg style=\"float: none;\" alt=\"\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ENFBCVDFAFR_03_100x100.png?v=1777784972\"\u003e       \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ENFBCVDFAFR_04_100x100.png?v=1777785034\" alt=\"\" style=\"float: none;\"\u003e          \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ENFBCVDFAFR_05_100x100.png?v=1777785872\" alt=\"\" style=\"float: none;\"\u003e   \u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eOptional Function (not included)\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eThe gas pre-heating unit with 316L material and maximum heating temperature of 600 ℃ can be supplied upon request. \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e         \u003cimg style=\"float: none;\" alt=\"\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ENFBCVDFAFR_07_100x100.png?v=1777786205\"\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eNotes\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eThe door is not allowed to be opened when the furnace temperature higher than 300 ℃\u003c\/li\u003e\n\u003cli\u003eThe relative pressure inside the quart tube should less than 0.125 MPa \u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003eThe hazardous and flammable gases should be highly cautious, and the protections should be prepared before operation.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eDimension\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eL1100 × W650 × H1800 mm\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eWeight\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003e~200 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/pii\/S2666821123001114\"\u003eS. Aslam, et al., A new route to apply nanometric alumina coating on powders by fluidized bed chemical vapor deposition, Chemical Engineering Journal Advances, 2023,16, 100554\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.mdpi.com\/2079-6412\/15\/3\/322\"\u003eB. Li, et al., The Fluidized Bed-Chemical Vapor Deposition Coating Technology of Micro-Nano Particles: Status and Prospective, Coatings 2025, 15(3), 322\u003c\/a\u003e \u003c\/p\u003e","brand":"NBD","offers":[{"title":"Default Title","offer_id":47623180746982,"sku":"ENFBCVDFAFR","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ENFBCVDFAFR_main.png?v=1777784767"},{"product_id":"epebec","title":"ECS-P Electron Beam Evaporation Coater, EPEBEC","description":"\u003cp\u003e An Electron Beam (E-beam) Evaporation Coater is a sophisticated Physical Vapor Deposition (PVD) instrument used to deposit high-purity thin films. Unlike standard thermal evaporation, which uses resistive heating, E-beam evaporation utilizes a high-energy electron beam to directly heat the source material. This technology is essential for depositing materials with extremely high melting points that would otherwise destroy a traditional resistive boat or filament.\u003c\/p\u003e\n\u003cp\u003eA high-performance E-beam system consists of several integrated sub-systems designed to manage high energy in a vacuum environment. (1) \u003cstrong\u003eElectron Beam Source (E-Gun)\u003c\/strong\u003e: A tungsten filament is heated to emit electrons via thermionic emission. Then a high-voltage field (typically 5 to 10 kV) accelerates these electrons toward the target. To protect the filament from being coated by the evaporating material, the electron beam is bent 270° using permanent magnets or electromagnets. This ensures only the beam reaches the crucible. (2) \u003cstrong\u003eCrucible and Multi-Pocket Hearth\u003c\/strong\u003e: Because the electron beam delivers intense localized heat, the copper hearth must be continuously water-cooled to prevent the crucible itself from melting.  Most systems feature a rotating \"pocket\" design (e.g., 4 or 6 pockets), allowing for the sequential deposition of different materials (like Ti\/Au or Al2O3\/Pt) without breaking the vacuum. (3) \u003cstrong\u003eVacuum System\u003c\/strong\u003e: To ensure the electrons reach the target without colliding with gas molecules, the system must operate at high vacuum. Typically 10^{-4} Pa to 10^{-7} Pa, which ssually a combination of a dry scroll pump (roughing) and a high-speed Turbomolecular or Cryogenic pump.\u003c\/p\u003e\n\u003ctable width=\"100%\" style=\"height: 473px;\"\u003e\n\u003ctbody\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eEPEBEC (EP-EBEC)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003cem\u003ePower\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eAC380V±10%, three-phases, 50\/60Hz, 4000 W\u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 176.2px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 176.2px;\"\u003e\u003cem\u003eElectron Beam Evaporator Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 176.2px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eEvaporation Source: 8-10 kW evaporation gun\u003c\/li\u003e\n\u003cli\u003e4-8 crucibles can be supplied\u003c\/li\u003e\n\u003cli\u003eAdditional 2-4 resistance or organic sources can be provided\u003c\/li\u003e\n\u003cli\u003eSample Stage: ≤200mm * 200mm\u003c\/li\u003e\n\u003cli\u003eFilm Uniformity: ±3％\u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003eVacuum: ≤3*10^(-5) Pa, Mechanical Vacuum Pump + Turbo Pump\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003eVacuum Rate: 8*10^(-4) in 30 min, and can keep 12 h ≤5 Pa\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003eA Water chiller is included to cool down the cover flange.\u003c\/span\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 67.2px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 67.2px;\"\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 67.2px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 86.8px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 86.8px;\"\u003e\u003ci\u003eDimension\u003c\/i\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 86.8px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003eL1800 × W800 × H1800 mm\u003c\/li\u003e\n\u003cli\u003eIt can be integrated with Ar-filled glovebox for air\/humidity-sensitive materials processing \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e         \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EPEBEC_02_100x100.png?v=1778118772\" style=\"float: none;\"\u003e\u003c\/p\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003ci\u003eWeight\u003c\/i\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003e~250 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e \u003c\/p\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S004060900600825X\"\u003eC. L. Li, et al., Physical and electrochemical characterization of amorphous lithium lanthanum titanate solid electrolyte thin-film fabricated by e-beam evaporation, Thin Solid Films, 2006, 515, 1886-1892\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/link.springer.com\/article\/10.1007\/s11581-020-03842-9\"\u003eD. Sivlin, et al., ZrO2 coating via e-beam evaporation on PE separators for lithium-ion batteries, Ionics, 2021, 27, 577–586\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S2214785323008921\"\u003eS. Varghese, et al., Thin films of solid electrolyte lithium sulfate deposited by e-beam evaporation, Materials Today Proceedings, DOI: 10.1016\/j.matpr.2023.02.328\u003c\/a\u003e. \u003c\/p\u003e","brand":"PDZK","offers":[{"title":"Default Title","offer_id":47633726734566,"sku":"EPEBEC","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EPEBEC_main.png?v=1778113368"}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/collections\/EGS2STE_main_99a39e1e-0234-402b-9d25-56e8e38bd5a4.png?v=1777710809","url":"https:\/\/echemsupplies.com\/collections\/vapor-phase-synthesis.oembed","provider":"EChem Supplies","version":"1.0","type":"link"}