{"product_id":"ecessdcmsc","title":"ECS-C Economic Single-Source DC Magnetron Sputtering Coater, ECESSDCMSC","description":"\u003cp\u003eA Single-Source DC Magnetron Sputtering Coater is a streamlined Physical Vapor Deposition (PVD) system designed for depositing high-quality conductive thin films. Unlike multi-source or RF systems, this configuration is optimized for a single material target—typically a metal—making it the \"workhorse\" for creating current collectors, seed layers, and conductive contacts in battery research.\u003c\/p\u003e\n\u003cp\u003eAs for depositing metallic materials, Direct Current (DC) is the most efficient power source. (1) \u003cstrong\u003eHigh Deposition Rate\u003c\/strong\u003e: DC sputtering is significantly faster than RF sputtering for metals like Copper (Cu), Aluminum (Al), Titanium (Ti), and Gold (Au). (2) \u003cstrong\u003eSystem Simplicity\u003c\/strong\u003e: It does not require complex impedance matching networks, making it more reliable and easier to maintain in a busy R\u0026amp;D lab. (3) \u003cstrong\u003eCost-Effectiveness\u003c\/strong\u003e: Single-source DC units have a smaller footprint and lower power requirements, ideal for benchtop installation or integration into a single-chamber glovebox.\u003c\/p\u003e\n\u003ctable width=\"100%\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eECESSDCMSC (EC-ESSDCMSC)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePower\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eAC220V±10%, single-phases, 50\/60Hz, 2000 W\u003c\/li\u003e\n\u003cli\u003eDC power output is 500 W\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eSample Stage \u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eΦ100 mm\u003c\/li\u003e\n\u003cli\u003eHeating Temperature: RT-500 °C\u003c\/li\u003e\n\u003cli\u003eRotation Speed: Max. 20 rpm\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eSputtering Gun\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003e2\" \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eVacuum Chamber System\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eQuartz (Φ180mm*H200 mm) or SS304 (Φ194mm*H250 mm)\u003c\/li\u003e\n\u003cli\u003eVacuum Port: KF40; Ventilation Port: KF16\u003c\/li\u003e\n\u003cli\u003eVacuum Level: 0.3 Pa\u003c\/li\u003e\n\u003cli\u003eVacuum Pump Speed: 1.1 L\/s (turbo pump with 600 L\/s is available upon request).\u003c\/li\u003e\n\u003cli\u003eThe real-time film thickness gauge is available upon request (\u003cspan style=\"color: rgb(255, 42, 0);\"\u003enot included\u003c\/span\u003e).\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e            \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ECESSDCMSC_03_100x100.png?v=1777699830\" alt=\"\" style=\"float: none;\"\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eDimension\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eL550 × W350 × H400 mm\u003c\/li\u003e\n\u003cli\u003eIt can be integrated with Ar-filled glovebox for air\/humidity-sensitive materials processing \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eWeight\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003e~90 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S0378775315306662\"\u003eS. Lobe, et al., Radio frequency magnetron sputtering of Li7La3Zr2O12 thin films for solid-state batteries, Journal of Power Sources, 2016, 307, 684-689\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S2405829721001549\"\u003eY. Ma, et al., Materials and structure engineering by magnetron sputtering for advanced lithium batteries, Energy Storage Materials, 2021, 39, 203-224\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/advanced.onlinelibrary.wiley.com\/doi\/abs\/10.1002\/aenm.202403117\"\u003eY. Yao, et al., Prospective of Magnetron Sputtering for Interface Design in Rechargeable Lithium Batteries, Adv. Energy Mater., 2024, 14, 2403117\u003c\/a\u003e. \u003c\/p\u003e","brand":"CYKY","offers":[{"title":"Quartz","offer_id":47617811874022,"sku":"ECESSDCMSCQ","price":8888888.0,"currency_code":"USD","in_stock":true},{"title":"SS304","offer_id":47617811906790,"sku":"ECESSDCMSCSS","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/ECESSDCMSC_01.png?v=1777699600","url":"https:\/\/echemsupplies.com\/products\/ecessdcmsc","provider":"EChem Supplies","version":"1.0","type":"link"}