{"product_id":"epsbssmsc","title":"ECS-PS Benchtop Single-Source DC \u0026 RF Magnetron Sputtering Coater, EPSBSSMSC","description":"\u003cp\u003eA Benchtop DC \u0026amp; RF Magnetron Sputtering Coater is a versatile Physical Vapor Deposition (PVD) system designed for R\u0026amp;D environments. By integrating both Direct Current (DC) and Radio Frequency (RF) power sources, this single unit can deposit a wide array of materials, from conductive metals to insulating ceramics and oxides.\u003c\/p\u003e\n\u003cp\u003eIndustrial-grade benchtop models are designed for precision within a small footprint: (1) \u003cstrong\u003eMagnetron Sputtering Head\u003c\/strong\u003e: Uses strong magnets behind the target to trap electrons, increasing plasma density and allowing for lower operating pressures (10^{-3} to 10^{-2} mbar). (2) \u003cstrong\u003eChamber\u003c\/strong\u003e: Usually a high-purity stainless steel or quartz cylinder with a hinged lid for easy target swapping. (3) \u003cstrong\u003eSample Stage\u003c\/strong\u003e: Typically heatable (up to 500 ℃) and rotatable (1–20 RPM) to ensure the Al2O3 or ZnO coating is uniform across the entire electrode surface. (4) \u003cstrong\u003eGas Control\u003c\/strong\u003e: Uses Mass Flow Controllers (MFC) for Argon (sputtering gas) and sometimes Oxygen\/Nitrogen for \"Reactive Sputtering.\"  \u003c\/p\u003e\n\u003ctable width=\"100%\" style=\"height: 592.8px;\"\u003e\n\u003ctbody\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eEPSBSSMSC (EPS-BSSMSC)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003cem\u003ePower\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eAC220V±10%, single-phases, 50\/60Hz, 2000 W\u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 32.8px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 32.8px;\"\u003e\u003cem\u003eMagnetron Sputtering Sources\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 32.8px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eDC mode: 500 W for metal sputtering\u003c\/li\u003e\n\u003cli\u003eRF mode: 300 W, 14 kHz for non-metal sputtering\u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 263.2px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 263.2px;\"\u003e\u003cem\u003eMagnetron Sputtering Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 263.2px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eMagnetron Sputtering Head: 2\" head (1 unit for standard) with water cooling jackets. Multiple magnetron heads can be supplied upon request. \u003c\/li\u003e\n\u003cli\u003eThe shutter can be manually to open\/block the sputtering pathway\u003c\/li\u003e\n\u003cli\u003eSputtering target with Φ2\" x T1\/8\"\u003c\/li\u003e\n\u003cli\u003eSputtering Distance: 50-80 mm, adjustable. Sputtering Angle: 0-25\u003cspan\u003e°\u003c\/span\u003e\n\u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003eSample Stage Temperature: ≤350 ℃\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003eMechanical Vacuum Pump + Turbo Pump (\u003cspan style=\"color: rgb(255, 42, 0);\"\u003eOptional\u003c\/span\u003e): 5*10^(-5) Pa\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003eVacuum Chamber Size: Φ220×H340 mm \u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003e\u003cspan\u003eA Water chiller is included to cool down the cover flange.\u003c\/span\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 67.2px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 67.2px;\"\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 67.2px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 86.8px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 86.8px;\"\u003e\u003ci\u003eDimension\u003c\/i\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 86.8px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003eL600 × W600 × H1000 mm\u003c\/li\u003e\n\u003cli\u003eIt can be integrated with Ar-filled glovebox for air\/humidity-sensitive materials processing \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"width: 17.9856%; height: 47.6px;\"\u003e\u003ci\u003eWeight\u003c\/i\u003e\u003c\/td\u003e\n\u003ctd style=\"width: 81.6547%; height: 47.6px;\"\u003e\n\u003cdiv style=\"text-align: left;\"\u003e\n\u003cul\u003e\n\u003cli\u003e~90 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e \u003c\/p\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S0378775315306662\"\u003eS. Lobe, et al., Radio frequency magnetron sputtering of Li7La3Zr2O12 thin films for solid-state batteries, Journal of Power Sources, 2016, 307, 684-689\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S2405829721001549\"\u003eY. Ma, et al., Materials and structure engineering by magnetron sputtering for advanced lithium batteries, Energy Storage Materials, 2021, 39, 203-224\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/advanced.onlinelibrary.wiley.com\/doi\/abs\/10.1002\/aenm.202403117\"\u003eY. Yao, et al., Prospective of Magnetron Sputtering for Interface Design in Rechargeable Lithium Batteries, Adv. Energy Mater., 2024, 14, 2403117\u003c\/a\u003e. \u003c\/p\u003e","brand":"PDZK","offers":[{"title":"DC","offer_id":47612688531686,"sku":"EPSBSSMSCDC","price":8888888.0,"currency_code":"USD","in_stock":true},{"title":"DC \u0026 RF","offer_id":47612688597222,"sku":"EPSBSSMSCDCRF","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EPSBSSMSC_main.png?v=1777664607","url":"https:\/\/echemsupplies.com\/products\/epsbssmsc","provider":"EChem Supplies","version":"1.0","type":"link"}