{"product_id":"eymbtaldm","title":"ECS-Y Mini Benchtop Thermal Atomic Layer Deposition (ALD) Machine (Sample: Max. 4\"), EYMBTALDM","description":"\u003cp\u003eA thermal atomic layer deposition (ALD) machine is a precise thin-film coating system that deposits materials one atomic layer at a time using alternating, self-limiting chemical reactions at elevated temperatures (150-350 degrees). It ensures high conformality and atomic-scale thickness control, ideal for high-aspect-ratio 3D structures and, typically, for creating oxides, nitrides, and other thin films\u003c\/p\u003e\n\u003cp\u003eThe key components and features are: (1) \u003cstrong\u003eReaction Chamber\u003c\/strong\u003e: Heated, high-vacuum chamber where the substrate (up to 6–8 inches, typically) is held. (2) \u003cstrong\u003ePrecursor Delivery System\u003c\/strong\u003e: Multiple heated gas lines with MFCs (Mass Flow Controllers) allow for introducing alternating precursors (e.g., metal-organic precursors and H2O, or O3). (3) \u003cstrong\u003ePulse\/Purge Valves\u003c\/strong\u003e: High-speed, high-temperature valves, such as those found on the Veeco Savannah, control the precise, alternating dosage and inert gas purge cycles.\u003c\/p\u003e\n\u003cp\u003eThe mini benchtop thermal ALD has following unique features: (1) \u003cstrong\u003eThroughput\u003c\/strong\u003e: These systems are \"one-at-a-time.\" Coating a full roll of foil for a pilot line would require a Spatial ALD or Roll-to-Roll system, which are much larger than benchtop units. (2) \u003cstrong\u003ePrecursor Costs\u003c\/strong\u003e: While the amount used is tiny, specialized precursors (like those for solid-state electrolyte coatings) can be expensive. (3) \u003cstrong\u003eCycle Time\u003c\/strong\u003e: ALD is a slow process. Deposition of a 5-10 nm layer can take 1 to 2 hours depending on the cycle purge times.\u003c\/p\u003e\n\u003cp\u003eThe general working mechanism of the thermal ALD process are shown below:\u003c\/p\u003e\n\u003cdiv style=\"text-align: start;\"\u003e\u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYMBTALDM_02_100x100.png?v=1777409245\" alt=\"\" style=\"float: none;\"\u003e\u003c\/div\u003e\n\u003ctable width=\"100%\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eEYMBTALDM (EY-MBTALDM)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003ePower\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eAC220V±10%, single phase, 50\/60Hz, 1500 W\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eALD Machine Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eMax. Sample: 4\" wafer with thickness less than 5 mm\u003c\/li\u003e\n\u003cli\u003eHeating Temperature: RT-360 ℃\u003c\/li\u003e\n\u003cli\u003eFor powder sample, the special powder tray can be supplied upon request.\u003c\/li\u003e\n\u003cli\u003ePrecursor: 4*50 mL precursor bubblers (2 stainless steel and 2 heated silicone types) are included. The heating temperature is RT-180 ℃. \u003c\/li\u003e\n\u003cli\u003eSix fast-response ALD valves with heating temperature of RT-200℃. \u003c\/li\u003e\n\u003cli\u003eMFC: Max. 200 sccm\u003c\/li\u003e\n\u003cli\u003eVacuum gauge: Inficon brand with maximum range of 10 Torr.\u003c\/li\u003e\n\u003cli\u003eVacuum Pump with 30 m3\/h flow\u003c\/li\u003e\n\u003cli\u003eThe ALD parameters can be edited in the touch screen and the data can be recorded in real time. \u003c\/li\u003e\n\u003cli\u003eThe alarm and safety lock are available for monitoring the temperature, pressure, and flow. \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eDimension\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eL550 * W470 * H470 mm\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\u003cem\u003eWeight\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003e~50 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/advanced.onlinelibrary.wiley.com\/doi\/abs\/10.1002\/adem.201300132\"\u003eA. Cappella, et al., High Temperature Thermal Conductivity of Amorphous Al2O3 Thin Films Grown by Low Temperature ALD, Adv. Engineering Mater., 2013, 15, 1046-1050\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/onlinelibrary.wiley.com\/doi\/abs\/10.1002\/cvde.201207033\"\u003eS. E. Potts, et al., Room-Temperature ALD of Metal Oxide Thin Films by Energy-Enhanced ALD, Chemical Vapor Deposition, 2013, 19, 125-133\u003c\/a\u003e. \u003c\/p\u003e","brand":"YMKJ","offers":[{"title":"Default Title","offer_id":47585641988326,"sku":"EYMBTALDM","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYMBTALDM_main.png?v=1777408871","url":"https:\/\/echemsupplies.com\/products\/eymbtaldm","provider":"EChem Supplies","version":"1.0","type":"link"}