{"product_id":"eypcraldm","title":"ECS-Y Rotary Atomic Layer Deposition (ALD) Machine for Powder Coating, EYPCRALDM","description":"\u003cp\u003eRotary Bed Atomic Layer Deposition (Rotary ALD) is a mechanical agitation method specifically designed to overcome the limitations of static beds and the complexities of fluidization when coating powders. It uses physical rotation to tumble the powder, ensuring every surface is exposed to the precursor gases.\u003c\/p\u003e\n\u003cp\u003eIn a rotary system, the powder is placed inside a drum or cylinder that rotates within a vacuum chamber. This movement creates a constant \"tumbling\" effect—similar to a clothes dryer or a cement mixer—which prevents particle agglomeration and eliminates \"dead zones\" where precursors might not reach. (1) \u003cstrong\u003eMechanical Mixing\u003c\/strong\u003e: The drum rotates at a controlled speed (typically 10 to 100 RPM for lab scale. (2) \u003cstrong\u003ePrecursor Dosing\u003c\/strong\u003e: Gases are introduced through the axis of rotation or via a fixed delivery tube inside the drum. (3) \u003cstrong\u003eSelf-Limiting Reaction\u003c\/strong\u003e: Just like standard ALD, the gas reacts with the surface of the moving particles until all sites are occupied. (4) \u003cstrong\u003ePurging\u003c\/strong\u003e: Inert gas sweeps through the tumbling bed to remove byproducts and excess precursor before the next cycle begins.  \u003c\/p\u003e\n\u003cp\u003eRotary ALD is particularly useful when working with cohesive powders or high-density materials (like certain metal oxides or catalysts) that are notoriously difficult to fluidize. It allows you to achieve the same Al2O3 or TiO2 conformal coating without the risk of \"slugging\" or \"channeling\" that often occurs in gas-fed columns.\u003c\/p\u003e\n\u003cp\u003eThe diagram of the general working mechanism of the rotary ALD process is shown below:\u003c\/p\u003e\n\u003cdiv style=\"text-align: start;\"\u003e\u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYPCRALDM_main_160x160.png?v=1777484663\" style=\"margin-bottom: 16px; float: none;\"\u003e\u003c\/div\u003e\n\u003ctable style=\"height: 1246.2px;\" width=\"100%\"\u003e\n\u003ctbody\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eEYPCRALDM (EY-PC-RALDM)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003ePower\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eAC380V±10%, three-phases, 50\/60Hz, 7 kW\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 571.4px;\"\u003e\n\u003ctd style=\"height: 571.4px;\"\u003e\u003cem\u003eRotary ALD Machine Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 571.4px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eSS304 dual-vacuum chamber design \u003c\/li\u003e\n\u003cli\u003ePowder Container Volume: 0.33 L (two included), the recommended maximum loading volume ≤0.13L (For LiCoO2 as example, ~100 g). The rotation speed\" 0-60 rpm, adjustable\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e        \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYPCRALDM_05_100x100.png?v=1777487314\" alt=\"\" style=\"float: none;\" width=\"94\" height=\"94\"\u003e       \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYPCRALDM_03_100x100.png?v=1777485851\" alt=\"\" style=\"float: none;\"\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003eProcessing Temperature: RT-300 ℃\u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003ePrecursor: One 200 mL metal precursor bubbler with two channels; 4*50 mL precursor bubblers with single channel for metal- and oxidized sources. The heating temperature is RT-190 ℃. Two more connection ports are reserved for optional O3 or H2S precursors. \u003c\/li\u003e\n\u003cli\u003eSix fast-response ALD valves with heating temperature of RT-200℃. \u003c\/li\u003e\n\u003cli\u003eMFC: Max. 200 sccm\u003c\/li\u003e\n\u003cli\u003eVacuum gauge: one set with 100 Torr and one set with 1000 Torr to show the inner and outer chamber vacuum level. The ultimate vacuum is \u0026lt;0.1 Torr\u003c\/li\u003e\n\u003cli\u003eVacuum Pump with 17 m3\/h flow\u003c\/li\u003e\n\u003cli\u003eThe ALD parameters can be edited in the touch screen and the data can be recorded in real time. \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e          \u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYPCRALDM_04_100x100.png?v=1777486932\" alt=\"\" style=\"float: none;\"\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003eThe alarm and safety lock are available for monitoring the temperature, pressure, and flow. \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 417.2px;\"\u003e\n\u003ctd style=\"height: 417.2px;\"\u003e\u003cem\u003e\u003cspan style=\"color: rgb(255, 42, 0);\"\u003eOptional\u003c\/span\u003e Features for Add-On (not included)\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 417.2px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eThe QCM unit can be added to monitor the growth rate and thickness in real time. Accuracy is 0.1 Å. The maximum measuring temperature is 200 ℃\u003c\/li\u003e\n\u003cli\u003eThe glovebox (O2\/H2O\u0026lt;1 ppm) can be integrated for precursor loading and transfer.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e            \u003cimg style=\"float: none;\" alt=\"\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYPCRALDM_06_100x100.png?v=1777487826\"\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003eCustomized substrate stack for holding multiple substrates (50*85 mm) can be supplied upon request.\u003c\/li\u003e\n\u003cli\u003eO3 generator with O2 flow meter can be supplied to replace the conventional H2O oxidant source. \u003c\/li\u003e\n\u003cli\u003eH2S gas flow channel can be added upon request. \u003c\/li\u003e\n\u003cli\u003eThe solid precursor bubbler with dual channels can be supplied upon request.\u003c\/li\u003e\n\u003cli\u003eThe RGA module can be added to analyze the gas residuals.\u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 67.2px;\"\u003e\n\u003ctd style=\"height: 67.2px;\"\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 67.2px;\"\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003eDimension\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eL1150 * W925 * H1850 mm\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003eWeight\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003e~350 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/pubs.aip.org\/avs\/jva\/article-abstract\/38\/5\/052403\/246727\/High-capacity-rotary-drum-for-atomic-layer?redirectedFrom=fulltext\"\u003eM. W. Coile, et al., High-capacity rotary drum for atomic layer deposition onto powders and small mechanical parts in a hot-walled viscous flow reactor, J. Vac. Sci. Technol. A, 2020, 38, 052403.\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S0040609025000574\"\u003eK. Seong, et al., Rotary-type atomic layer deposition of aluminum oxide coating on micropowder for secondary battery anode applications, Thin Solid Films, 2025, 817, 140656.\u003c\/a\u003e \u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/advanced.onlinelibrary.wiley.com\/doi\/abs\/10.1002\/admi.201800581\"\u003eS. Adhikari, et al., Progress in Powder Coating Technology Using Atomic Layer Deposition, Adv. Mater. Interfaces, 2018, 5, 1800581.\u003c\/a\u003e \u003c\/p\u003e","brand":"YMKJ","offers":[{"title":"Default Title","offer_id":47589236113638,"sku":"EYPCRALDM","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYPCRALDM_main.png?v=1777484663","url":"https:\/\/echemsupplies.com\/products\/eypcraldm","provider":"EChem Supplies","version":"1.0","type":"link"}