{"product_id":"eypealdm","title":"ECS-Y Plasma-Enhanced Atomic Layer Deposition (PEALD) Machine (Sample: Max. 8\"), EYPEALDM","description":"\u003cp\u003ePlasma-Enhanced Atomic Layer Deposition (PE-ALD) is an advanced variant of the ALD process that replaces thermal energy with highly reactive plasma species (radicals, ions, and electrons) to drive surface reactions. While thermal ALD relies on heating the substrate—often to temperatures between 200°C and 400°C—PE-ALD can achieve high-quality, dense films at much lower temperatures, sometimes even at room temperature.\u003c\/p\u003e\n\u003cp\u003eIn a standard thermal cycle, the second precursor (e.g., water or ammonia) requires thermal energy to react with the first precursor on the surface. In PE-ALD, a plasma discharge (typically O2, N2, or H2 plasma) generates reactive radicals that provide the necessary chemical energy.\u003c\/p\u003e\n\u003cp\u003eThe diagram of the working mechanism of the plasma-enhanced ALD process is shown below:\u003c\/p\u003e\n\u003cdiv style=\"text-align: start;\"\u003e\u003cimg src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYPEALDM_02_160x160.png?v=1777492023\" style=\"margin-bottom: 16px; float: none;\"\u003e\u003c\/div\u003e\n\u003ctable style=\"height: 703.8px;\" width=\"100%\"\u003e\n\u003ctbody\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003ePart Number\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eEYPEALDM (EY-PEALDM)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003ePower\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eAC380V±10%, three-phases, 50\/60Hz, 18 kW\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 320.2px;\"\u003e\n\u003ctd style=\"height: 320.2px;\"\u003e\u003cem\u003eALD Machine Features\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 320.2px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eMax. Sample: 8\" wafer (200mm*200mm)\u003c\/li\u003e\n\u003cli\u003eHeating Temperature for Sample Stage: RT-500 ℃\u003cbr\u003e\n\u003c\/li\u003e\n\u003cli\u003ePrecursor: 3*50 mL precursor bubblers and one reaction channel are included. The heating temperature is RT-200 ℃. \u003c\/li\u003e\n\u003cli\u003eIt can be upgraded to six precursors and two reaction channels upon request.\u003c\/li\u003e\n\u003cli\u003eFour fast-response ALD valves with heating temperature of RT-200℃. \u003c\/li\u003e\n\u003cli\u003eMFC: Max. 200 sccm\u003c\/li\u003e\n\u003cli\u003e\u003cspan style=\"color: rgb(255, 42, 0);\"\u003eRF power: 0-1000 W \u003c\/span\u003e\u003c\/li\u003e\n\u003cli style=\"color: rgb(255, 42, 0);\"\u003e\u003cspan style=\"color: rgb(255, 42, 0);\"\u003eThe plasma system can support four gas flows\u003c\/span\u003e\u003c\/li\u003e\n\u003cli\u003eVacuum gauge: dual-grade, 0.0005 Torr -1000 Torr.\u003c\/li\u003e\n\u003cli\u003eVacuum Pump can support \u0026lt;5x10-3 Torr vacuum level\u003c\/li\u003e\n\u003cli\u003eThe ALD parameters can be edited in the individual touch screen and the data can be recorded in real time. \u003c\/li\u003e\n\u003cli\u003eThe alarm and safety lock are available for monitoring the temperature, pressure, and flow. \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 126px;\"\u003e\n\u003ctd style=\"height: 126px;\"\u003e\u003cem\u003eOptional Module for Add-On\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 126px;\"\u003e\n\u003cul\u003e\n\u003cli\u003eThe QCM unit can be added to monitor the growth rate and thickness in real time. Accuracy is 0.1 Å. The maximum measuring temperature is 200 ℃\u003c\/li\u003e\n\u003cli\u003eO3 generator with O2 flow meter can be supplied to replace the conventional H2O oxidant source. \u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 67.2px;\"\u003e\n\u003ctd style=\"height: 67.2px;\"\u003e\u003cem\u003eCertification\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 67.2px;\"\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eCE certified\u003c\/li\u003e\n\u003cli\u003eUL and CSA certification is available upon request at extra cost\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003eDimension\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003eL1150 * W750 * H1450 mm\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr style=\"height: 47.6px;\"\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\u003cem\u003eWeight\u003c\/em\u003e\u003c\/td\u003e\n\u003ctd style=\"height: 47.6px;\"\u003e\n\u003cdiv\u003e\n\u003cul\u003e\n\u003cli\u003e~500 kg\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/div\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003cp\u003e\u003cstrong\u003eReferences\u003c\/strong\u003e:\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.sciencedirect.com\/science\/article\/abs\/pii\/S0040609011004998\"\u003eHyungjun Kim, et al., Characteristics and applications of plasma enhanced-atomic layer deposition, Thin Solid Films, 2011, 519, 6639-6644\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/pubs.aip.org\/avs\/jva\/article-abstract\/38\/4\/040801\/246987\/The-role-of-plasma-in-plasma-enhanced-atomic-layer?redirectedFrom=fulltext\"\u003eD. R. Boris, et al., The role of plasma in plasma-enhanced atomic layer deposition of crystalline films, J. Vac. Sci. Technol. A, 2020, 38, 040801.\u003c\/a\u003e \u003c\/p\u003e","brand":"YSKJ","offers":[{"title":"Default Title","offer_id":47589365874918,"sku":"EYPEALDM","price":8888888.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0774\/6591\/1526\/files\/EYPEALDM_main.png?v=1777492584","url":"https:\/\/echemsupplies.com\/products\/eypealdm","provider":"EChem Supplies","version":"1.0","type":"link"}