ECS-SL Economic Programmable Spin Coater with Vacuum Chunk (Max. 150mm, 10000 rpm), ESLEPSCVC
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A programmable spin coater with a vacuum chuck is the gold standard for thin-film fabrication in academic, R&D, and cleanroom environments. It allows you to deposit highly uniform polymer, photoresist, sol-gel, or perovskite layers on flat substrates (such as silicon wafers, glass slides, or plastic films). The two essential elements of this tool are precise multi-step programming (to control the fluid dynamics and solvent evaporation) and vacuum sample retention (to hold the substrate perfectly flat and secure at high speeds).
A standard programming sequence includes three distinct phases: (1) Dispense / Spread Phase (Low RPM): The substrate spins slowly (e.g., 100 to 500 RPM) while the liquid is dispensed. This spreads the fluid evenly across the surface without flinging it off. (2) Spin / Thinning Phase (High RPM): The motor accelerates rapidly to the target coating speed (e.g., 2,000 to 6,000 RPM). This high-speed stage drives the fluid outward via centrifugal force, establishing the baseline film thickness. (3) Drying Phase (Sustained RPM): The rotation is held constant while the solvent evaporates. Programmable ramp speeds (the acceleration/deceleration rates measured in RPM/sec) are critical here; ramp speeds that are too fast or too slow can introduce "edge beads" or radial ripples in the dry film.
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Chamber & Chuck Features
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4" 6" 3" 2" 1" |
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