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ECS-SL Single-Channel Automatic Spin Coater with Vacuum Chunk (Max. 150-350mm, 10000 rpm), ESLSCASCVC

ECS-SL Single-Channel Automatic Spin Coater with Vacuum Chunk (Max. 150-350mm, 10000 rpm), ESLSCASCVC

In Stock SKU: ESLSCASCVCS
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A single-channel automatic spin coater is designed for high-reproducibility single-layer film deposition or single-solution dynamic casting. While multi-channel coaters are built for complex multi-layer stacks, a single-channel system focuses on absolute precision for one primary fluid line (such as a precursor solution, photoresist, or anti-solvent drip). It pairs a programmable spin motor with a single automated syringe pump or solenoid dispenser to remove human variation from dispense timing, height, and droplet volume.

It is mainly used for the following application fields: (1) Photoresist & Semiconductor Microlithography: Uniform deposition of positive/negative photoresists or anti-reflective coatings (ARC) onto silicon wafers. (2) Perovskite Anti-Solvent Quenching: Dedicated single-line dispensing of anti-solvent (e.g., chlorobenzene or diethyl ether) at an exact millisecond trigger during high-speed spinning to induce rapid, uniform crystallization. (3) Solid-State Electrolyte Films: Precision casting of polymer/salt matrices (e.g., PEO/LiTFSI) or slurry precursors onto current collectors. (4) Organic Photovoltaics (OPV) & OLEDs: Casting active donor/acceptor blend layers with tightly controlled film thickness.

Part Number
  • ESLSCASCVC (ESL-SCASC-VC)
Power
  • AC110-220V±10% (24V adaptor), single phase, 50/60Hz, 150 W
Solution Channels
  • Single solution or gas channels
  • Automatic solution dropping for layer-by-layer coating
  • Programmable parameter setting for automatic solution feeding

           

Chamber & Chuck Features


  • Chamber Materials: NPP
  • Vacuum Chunk Material: PTFE
  • (1) Small Chamber Diameter: 200 mm (the maximum acceptable substrate size is 150 mm); (2) Medium Chamber Diameter: 300 mm (the maximum acceptable substrate size is 250 mm); (3) Large Chamber Diameter: 400 mm (the maximum acceptable substrate size is 350 mm)
  • Vacuum Chunk Size: 4" (standard version included). Other customized options in 10-350 mm can be supplied upon request. 

           4"                     6"                   3"                    2"                    1"

        

      Rotation Speed & Time
      • 300-10000 rpm, adjustable
      • Rotation Stability:  ± 0.1% (Servo motor, 450 W that can support 500 g sample rotated at 2000 rpm)
      • Programmable 26 segments and each segment have 51 procedures for parameter setting. 
      • Acceleration speed can be set
      • Setting Time: 1-9999 s
      Vacuum Pump (Optional)
      • The oilless vacuum pump (ESOVP) can be considered for vacuum suction (-0.093 MPa). 

             

      • The vacuum sensor is available on the spin coater to avoid sample was thrown away when vacuum level is not enough.  
      Certification
      • CE certified
      • UL and CSA certification is available upon request at extra cost
      • One year warranty and lifetime technical support and service.
      Dimension
      • W260 * D350 * H260 mm
      Weight
      • ~12 kg

       

      References:

      P. Jiang, et al., Large-Scale Fabrication of Wafer-Size Colloidal Crystals, Macroporous Polymers and Nanocomposites by Spin-Coating, J. Am. Chem. Soc. 2004, 126, 42, 13778–13786

      M.D. Tyona, et al., A comprehensive study of spin coating as a thin film deposition technique and spin coating equipment, Advances in Materials Research, 2013, 2, 181-193

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