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ECS-Y Rotary Atomic Layer Deposition (ALD) Machine for Powder Coating, EYPCRALDM

ECS-Y Rotary Atomic Layer Deposition (ALD) Machine for Powder Coating, EYPCRALDM

In Stock SKU: EYPCRALDM
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Rotary Bed Atomic Layer Deposition (Rotary ALD) is a mechanical agitation method specifically designed to overcome the limitations of static beds and the complexities of fluidization when coating powders. It uses physical rotation to tumble the powder, ensuring every surface is exposed to the precursor gases.

In a rotary system, the powder is placed inside a drum or cylinder that rotates within a vacuum chamber. This movement creates a constant "tumbling" effect—similar to a clothes dryer or a cement mixer—which prevents particle agglomeration and eliminates "dead zones" where precursors might not reach. (1) Mechanical Mixing: The drum rotates at a controlled speed (typically 10 to 100 RPM for lab scale. (2) Precursor Dosing: Gases are introduced through the axis of rotation or via a fixed delivery tube inside the drum. (3) Self-Limiting Reaction: Just like standard ALD, the gas reacts with the surface of the moving particles until all sites are occupied. (4) Purging: Inert gas sweeps through the tumbling bed to remove byproducts and excess precursor before the next cycle begins.  

Rotary ALD is particularly useful when working with cohesive powders or high-density materials (like certain metal oxides or catalysts) that are notoriously difficult to fluidize. It allows you to achieve the same Al2O3 or TiO2 conformal coating without the risk of "slugging" or "channeling" that often occurs in gas-fed columns.

The diagram of the general working mechanism of the rotary ALD process is shown below:

Part Number
  • EYPCRALDM (EY-PC-RALDM)
Power
  • AC380V±10%, three-phases, 50/60Hz, 7 kW
Rotary ALD Machine Features
  • SS304 dual-vacuum chamber design 
  • Powder Container Volume: 0.33 L (two included), the recommended maximum loading volume ≤0.13L (For LiCoO2 as example, ~100 g). The rotation speed" 0-60 rpm, adjustable

               

  • Processing Temperature: RT-300 ℃
  • Precursor: One 200 mL metal precursor bubbler with two channels; 4*50 mL precursor bubblers with single channel for metal- and oxidized sources. The heating temperature is RT-190 ℃. Two more connection ports are reserved for optional O3 or H2S precursors. 
  • Six fast-response ALD valves with heating temperature of RT-200℃. 
  • MFC: Max. 200 sccm
  • Vacuum gauge: one set with 100 Torr and one set with 1000 Torr to show the inner and outer chamber vacuum level. The ultimate vacuum is <0.1 Torr
  • Vacuum Pump with 17 m3/h flow
  • The ALD parameters can be edited in the touch screen and the data can be recorded in real time. 

         

  • The alarm and safety lock are available for monitoring the temperature, pressure, and flow. 
Optional Features for Add-On (not included)
  • The QCM unit can be added to monitor the growth rate and thickness in real time. Accuracy is 0.1 Å. The maximum measuring temperature is 200 ℃
  • The glovebox (O2/H2O<1 ppm) can be integrated for precursor loading and transfer.

           

  • Customized substrate stack for holding multiple substrates (50*85 mm) can be supplied upon request.
  • O3 generator with O2 flow meter can be supplied to replace the conventional H2O oxidant source. 
  • H2S gas flow channel can be added upon request. 
  • The solid precursor bubbler with dual channels can be supplied upon request.
  • The RGA module can be added to analyze the gas residuals.
Certification
  • CE certified
  • UL and CSA certification is available upon request at extra cost
Dimension
  • L1150 * W925 * H1850 mm
Weight
  • ~350 kg

References:

M. W. Coile, et al., High-capacity rotary drum for atomic layer deposition onto powders and small mechanical parts in a hot-walled viscous flow reactor, J. Vac. Sci. Technol. A, 2020, 38, 052403.

K. Seong, et al., Rotary-type atomic layer deposition of aluminum oxide coating on micropowder for secondary battery anode applications, Thin Solid Films, 2025, 817, 140656. 

S. Adhikari, et al., Progress in Powder Coating Technology Using Atomic Layer Deposition, Adv. Mater. Interfaces, 2018, 5, 1800581. 

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